Abstract
The structure, as well as the phase and elemental compositions, of tantalum diboride-based nanostructured films deposited by rf magnetron sputtering under various conditions are studied by X-ray diffraction, electron microscopy, and secondary ion mass spectrometry. The physicomechanical properties of the films (hardness, as well as elastic and plastic properties) are determined. The maximum hardness and elastic modulus of the synthesized films are 42 are 240 GPa, respectively. The grain size is found to influence the physicomechanical and electrical properties of the films.
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Original Russian Text © A.A. Goncharov, P.I. Ignatenko, V.V. Petukhov, V.A. Konovalov, G.K. Volkova, V.A. Stupak, V.A. Glazunova, 2006, published in Zhurnal Tekhnicheskoĭ Fiziki, 2006, Vol. 76, No. 10, pp. 87–90.
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Goncharov, A.A., Ignatenko, P.I., Petukhov, V.V. et al. Composition, structure, and properties of tantalum boride nanostructured films. Tech. Phys. 51, 1340–1343 (2006). https://doi.org/10.1134/S1063784206100136
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DOI: https://doi.org/10.1134/S1063784206100136