Abstract
Thermal etching of LiF and MgF2 crystals with impurities of cobalt and nickel are studied using raster electron microscopy and atomic force microscopy with decoration. It is shown that impurity inclusions come out of the crystal on its surface from dislocations. There are differences between thermal etching in vacuum and in atmosphere of air. Crystallographically oriented terraced etch pits are formed after the egress of impurities from dislocations. Rectangular pits of thermal etching are formed after crystal annealing at 750°C in air. During thermal etching, a surface metal-containing nanosized film is formed. Oxidation of surface impurities is observed during thermal etching in an atmosphere of air or in atmosphere of residual air.
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Funding
This work was supported by project II.10.1.2 of program II.10.1. of fundamental research of Siberian Branch of Russian Academy of Sciences for 2017–2020, and Research and Development Work no. 1210331000066-3 of Ministry of Education and Science of Russia “Precision luminescent methods in laser physics and nanophotonics.”
The measurements were carried out using the equipment of Center for Collective Use “Baikal Nanotechnology Center.” The work was carried out within the framework of the REC “Baikal.”
This work was supported by Ministry of Science and Higher Education of the Russian Federation in the framework of the scientific and educational center “Baikal” (grant no. FZZS-2021-0007).
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Translated by S. Rostovtseva
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Ivanov, N.A., Nebogin, S.A., Kolesnikov, S.S. et al. Structure and Mechanisms of Formation of Nanosized Films of Impurity Metal of Cobalt and Nickel in Single Crystals of LiF and MgF2. Phys. Solid State 63, 1387–1396 (2021). https://doi.org/10.1134/S1063783421090134
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DOI: https://doi.org/10.1134/S1063783421090134