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Processes of silicide formation in the Fe/Si(111)7 × 7 system

  • Low-Dimensional Systems and Surface Physics
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Abstract

The initial stages of the formation of iron silicides in the Fe/Si(111)7 × 7 system in the course of solid-phase epitaxy are investigated using high-resolution photoelectron spectroscopy (∼100 meV) with synchrotron radiation. The spectra of the Si 2p core and valence-band electrons obtained after deposition of iron coverages of up to 28 monolayers on the surface of the sample and subsequent isochronous annealings at 650°C are measured and analyzed. It is shown that the first to form under Fe deposition is an ultrathin film of the metastable silicide FeSi with a CsCl-type structure, on which a layer of the Fe-Si solid solution with segregated silicon grows. At coverages in excess of 10 monolayers, an iron film grows on the surface of the sample. Annealing of a silicon crystal coated with a Fe layer leads to the sequential formation of two stable silicide phases, namely, the ɛ-FeSi and β-FeSi2 phases, in the near-surface region of the sample. It is found that the process of solid-phase synthesis of the ɛ-FeSi phase passes through the stage of transformation of the iron film into the Fe-Si solid solution.

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Authors and Affiliations

  1. Ioffe Physicotechnical Institute, Russian Academy of Sciences, Politekhnicheskaya ul. 26, St. Petersburg, 194021, Russia

    M. V. Gomoyunova, D. E. Malygin & I. I. Pronin

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  1. M. V. Gomoyunova
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  2. D. E. Malygin
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  3. I. I. Pronin
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Correspondence to M. V. Gomoyunova.

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Original Russian Text © M.V. Gomoyunova, D.E. Malygin, I.I. Pronin, 2008, published in Fizika Tverdogo Tela, 2008, Vol. 50, No. 8, pp. 1518–1523.

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Gomoyunova, M.V., Malygin, D.E. & Pronin, I.I. Processes of silicide formation in the Fe/Si(111)7 × 7 system. Phys. Solid State 50, 1579–1584 (2008). https://doi.org/10.1134/S1063783408080325

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  • DOI: https://doi.org/10.1134/S1063783408080325

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