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Polytypism of silicon carbide and Schottky barriers

  • Semiconductors and Dielectrics
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Abstract

The results obtained in our previous work [4] are revised taking into account the dependence of the electron affinity on the polytype of silicon carbide SiC. The dependence of the energy level of vacancies in a polytype of silicon carbide on the band gap is determined from the data on the Schottky barrier height and is explained in the framework of a simple two-band model.

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Original Russian Text © S.Yu. Davydov, O.V. Posrednik, 2006, published in Fizika Tverdogo Tela, 2006, Vol. 48, No. 2, pp. 218–219.

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Davydov, S.Y., Posrednik, O.V. Polytypism of silicon carbide and Schottky barriers. Phys. Solid State 48, 233–235 (2006). https://doi.org/10.1134/S1063783406020077

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  • DOI: https://doi.org/10.1134/S1063783406020077

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