Abstract
The contribution of electrons and holes to the electrical conduction of titanium dioxide TiO2 in the Si/TiO2/Al structure is determined in experiments on the injection of minority carriers from n-type and p-type silicon layers. It is established that both electrons and holes contribute to electrical conduction of the titanium dioxide layer in the Si/TiO2/Al structure; i.e., the electrical conduction of titanium dioxide has a two-band nature.
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Original Russian Text © D.V. Gritsenko, S.S. Shaĭmeev, V.V. Atuchin, T.I. Grigor’eva, L.D. Pokrovskiĭ, O.P. Pchelyakov, V.A. Gritsenko, A.L. Aseev, V.G. Lifshits, 2006, published in Fizika Tverdogo Tela, 2006, Vol. 48, No. 2, pp. 210–213.