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Lithography and Plasma Treatment Effect on Conductivity of Carbon Nanotubes

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Abstract

Transparency and sheet resistance measurements of transferred CNT film on glass substrate were performed. Effect of optical lithography and plasma treatment processes on CNT film sheet resistance was analyzed. CNT film demonstrates good electrical conductivity and chemical stability to post-growth processing techniques. The maximum increase in the sheet resistance of the CNT film after optical lithography and plasma treatment processes is no more than 7%.

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REFERENCES

  1. G. Xiao, Y. Tao, J. Lu, and Z. Zhang, in Proceedings of the 3rd International Nanoelectronics Conference INEC (IEEE, 2010), p. 208.

  2. S. A. Raudik, A. M. Mozharov, D. M. Mitin, A. D. Bolshakov, P. M. Rajanna, A. G. Nasibulin, and I. S. Mukhin, J. Phys.: Conf. Ser. 1124, 41040 (2018).

    Google Scholar 

  3. D. S. Kopylova, F. S. Fedorov, A. A. Alekseeva, E. P. Gilshteyn, A. P. Tsapenko, A. V. Bubis, A. K. Grebenko, Z. I. Popov, P. B. Sorokin, Y. G. Gladush, A. S. Anisimov, and A. G. Nasibulin, Nanoscale 10, 18665 (2018).

    Article  Google Scholar 

  4. A. Moisala, A. G. Nasibulin, D. P. Brown, H. Jiang, L. Khriachtchev, and E. I. Kauppinen, Chem. Eng. Sci. 61, 4393 (2006).

    Article  Google Scholar 

  5. K. K. Kim, J. J. Bae, H. K. Park, S. M. Kim, H. Z. Geng, K. A. Park, et al., J. Am. Chem. Soc. 130 (2008).

    Article  Google Scholar 

  6. A. Murat, I. Rungger, C. Jin, et al., J. Phys. Chem. 118, 3319 (2014).

    Article  Google Scholar 

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Funding

This work was carried out with the support of Skolkovo Institute of Science and Technology (Agreement no. 3663-MRA dated December 25, 2017), the Russian Federation President grant (MK-1458.2019.2), grants of government of the Russian Federation (3.9796.2017/8.9, 16.2593.2017/4.6).

D.M. Mitin thanks Russian Science Foundation (grant no. 17-79-30035) for supporting research in the field of CNT sheet resistance measurements.

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Authors and Affiliations

  1. Saint Petersburg Academic University, 194021, St. Petersburg, Russia

    D. M. Mitin, S. A. Raudik, A. D. Bolshakov, V. V. Fedorov, V. V. Nepokh & I. S. Mukhin

  2. Ioffe Institute, 194021, St. Petersburg, Russia

    D. M. Mitin

  3. ITMO University, 197101, St. Petersburg, Russia

    A. M. Mozharov & I. S. Mukhin

  4. Skolkovo Institute of Science and Technology, 121205, Moscow, Russia

    P. M. Rajanna & A. G. Nasibulin

Authors
  1. D. M. Mitin
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  2. S. A. Raudik
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  3. A. M. Mozharov
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  4. A. D. Bolshakov
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  5. V. V. Fedorov
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  6. V. V. Nepokh
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  7. P. M. Rajanna
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  8. A. G. Nasibulin
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  9. I. S. Mukhin
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Corresponding authors

Correspondence to D. M. Mitin, S. A. Raudik, A. M. Mozharov, A. D. Bolshakov, V. V. Fedorov, V. V. Nepokh, P. M. Rajanna, A. G. Nasibulin or I. S. Mukhin.

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Mitin, D.M., Raudik, S.A., Mozharov, A.M. et al. Lithography and Plasma Treatment Effect on Conductivity of Carbon Nanotubes. Semiconductors 53, 1926–1928 (2019). https://doi.org/10.1134/S1063782619140148

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  • DOI: https://doi.org/10.1134/S1063782619140148

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