, Volume 49, Issue 10, pp 1253–1258 | Cite as

Structural properties of ZnO:Al films produced by the sol–gel technique

  • E. P. ZaretskayaEmail author
  • V. F. Gremenok
  • A. V. Semchenko
  • V. V. Sidsky
  • R. L. Juskenas
Nonelectronic Properties of Semiconductors (Atomic Structure, Diffusion)


ZnO:Al films are produced by sol–gel deposition at temperatures of 350–550°C, using different types of reagents. Atomic-force microscopy, X-ray diffraction analysis, Raman spectroscopy, and optical transmittance measurements are used to study the dependence of the structural, morphological, and optical properties of the ZnO:Al coatings on the conditions of deposition. The optical conditions for the production of ZnO:Al layers with preferred orientation in the [001] direction and distinguished by small surface roughness are established. The layers produced in the study possess optical transmittance at a level of up to 95% in a wide spectral range and can be used in optoelectronic devices.


Raman Spectrum Thin Solid Film Zinc Acetate Aluminum Dope Zinc Oxide Aluminum Dope Zinc Oxide Film 
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Copyright information

© Pleiades Publishing, Ltd. 2015

Authors and Affiliations

  • E. P. Zaretskaya
    • 1
    Email author
  • V. F. Gremenok
    • 1
  • A. V. Semchenko
    • 2
  • V. V. Sidsky
    • 2
  • R. L. Juskenas
    • 3
  1. 1.Scientific and Practical Materials Research CenterNational Academy of Sciences of BelarusMinskBelarus
  2. 2.Gomel State UniversityGomelBelarus
  3. 3.State Research Institute Center for Physical Sciences and TechnologyVilniusLithuania

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