Abstract
We present the results of numerical studies of the influence of evaporation of anode material on the main characteristics of an arc discharge. Calculations were carried out for an arc discharge in helium as a buffer gas with high-melting-point (using graphite as an example) and low-melting-point (using copper as an example) anodes. The dependences of the main arc-discharge parameters on current density are presented. It is demonstrated that intense evaporation of particles of the anode material into the discharge gap occurs upon reaching the melting point of the anode surface. As a result, the plasma-forming ion is replaced, i.e., the carbon ion in the case of the graphite anode or a copper ion in the case of the copper anode becomes dominant. In the process, a jump in the potential is observed in the dependence of voltage on current density (the volt–ampere characteristic, VAC). Distribution of the main plasma parameters along the discharge gap is presented for different points in the VAC.
REFERENCES
Yu. P. Raizer, Gas Discharge Physics (Springer, Berlin, 1997; Intellekt, Dolgoprudnyi, 2009).
G. N. Rokhlin, Gas-Discharge Light Sources (Energoatomizdat, Moscow, 1991) [in Russian].
A. Fridman, A. Gutsol, and Y. I. Cho, Adv. Heat Transfer 40, 1 (2007).
B. Qin, T. Zhang, H. Chen, and Y. Ma, Carbon 102, 494 (2016).
Y. S. Park, S. Kodama, and H. Sekiguchi, Nanomaterials 11, 2214 (2021).
V. Vekselman, Y. Raitses, and M. N. Shneider, Phys. Rev. E 99, 063205 (2019).
B. A. Timerkaev, A. A. Kaleeva, D. B. Timerkaeva, and A. I. Saifutdinov, High Energy Chem. 53, 390 (2019).
M. B. Shavelkina, P. P. Ivanov, A. N. Bocharov, and R. H. Amirov, Plasma Chem. Plasma Process. 41, 171(2021).
M. Nowack, S. Leidich, D. Reuter, S. Kurth, M. Kuechler, A. Bertz, and T. Gessner, Sens. Actuators, A 188, 495 (2012).
S. Jhavar, C. P. Paul, and N. K. Jain, JOM 68, 1801 (2016).
M. Keidar and I. I. Beilis, J. Appl. Phys. 106, 103304 (2009).
A. Lebouvier, S. A. Iwarere, D. Ramjugernath, and L. Fulcheri, J. Phys. D: Appl. Phys. 46, 145203 (2013).
N. A. Timofeev, V. S. Sukhomlinov, G. Zissis, I. Yu. Mukharaeva, D. V. Mikhaylov, A. S. Mustafaev, P. Dupuis, D. Q. Solikhov, and V. S. Borodina, IEEE Trans. Plasma Sci. 49, 2387 (2021).
A. Maharaj, A. D’Angola, G. Colonna, and S. A. Iwarere, Front. Phys. 9, 748113 (2021). https://doi.org/10.3389/fphy.2021.748113
J. Musielok, Beitr. Plasmaphys. 17, 135 (1977).
L. E. Cram, L. Poladian, and G. Roumeliotis, J. Phys. D: Appl. Phys. 21, 418 (1988).
N. A. Almeida, M. S. Benilov, and G. V. Naidis, J. Phys. D: Appl. Phys. 41, 245201 (2008).
N. A. Almeida, M. S. Benilov, U. Hechtfischer, and G. V. Naidis, J. Phys. D: Appl. Phys. 42, 045210 (2009).
S. Kolev and A. A. Bogaerts, Plasma Sources Sci. Technol. 24, 015025 (2014).
A. I. Saifutdinov, I. I. Fairushin, and N. F. Kashapov, JETP Lett. 104, 180 (2016).
S. I. Eliseev, A. A. Kudryavtsev, H. Liu, Z. Ning, D. Yu, and A. S. Chirtsov, IEEE Trans. Plasma Sci. 44, 2536 (2016).
I. L. Semenov, I. V. Krivtsun, and U. Reisgen, J. Phys. D: Appl. Phys. 49, 105204 (2016).
N. A. Almeida, M. D. Cunha, and M. S. Benilov, J. Phys. D: Appl. Phys. 50, 385203 (2017).
S. Kolev, S. Sun, G. Trenchev, W. Wang, H. Wang, and A. Bogaerts, Plasma Processes Polym. 14, 1600110 (2017).
A. Khrabry, I. D. Kaganovich, V. Nemchinsky, and A. Khodak, Phys. Plasmas 25, 013521 (2018).
A. Khrabry, I. D. Kaganovich, V. Nemchinsky, and A. Khodak, Phys. Plasmas 25, 013522 (2018).
M. Baeva, D. Loffhagen, M. M. Becker, and D. Uhrlandt, Plasma Chem. Plasma Process. 39, 949 (2019).
M. Baeva, D. Loffhagen, and D. Uhrlandt, Plasma Chem. Plasma Process. 39, 1359 (2019).
M. S. Benilov, J. Phys. D: Appl. Phys. 53, 013002 (2019).
A. I. Saifutdinov, B. A. Timerkaev, and A. A. Saifutdinova, JETP Lett. 112, 405 (2020).
A. I. Saifutdinov, J. Appl. Phys. 129, 093302 (2021).
A. I. Saifutdinov, Plasma Sources Sci. Technol. 31, 094008 (2022).
M. Baeva, M. S. Benilov, T. Zhu, H. Testrich, T. Kewitz, and R. Foest, J. Phys. D: Appl. Phys. 55, 365202 (2022).
D. F. N. Santos, N. A. Almeida, M. Lisnyak, J. P. Gonnet, and M. S. Benilov, Phys. Plasmas 29, 043503 (2022).
M. Baeva, R. Methling, and D. Uhrlandt, Plasma Phys. Technol. 8, 1 (2021).
W.-Z. Wang, M.-Z. Rong, A. B. Murphy, Y. Wu, J. W. Spencer, and J. D. Yan, J. Phys. D: Appl. Phys. 44, 355207 (2011).
Y. Cressault, A. B. Murphy, Ph. Teulet, A. Gleizes, and M. Schnick, J. Phys. D: Appl. Phys. 46, 415207 (2013).
O. Knake and I. N. Stranskii, Usp. Fiz. Nauk 68, 261 (1959).
R. J. Thorn and G. H. Winslow, J. Chem. Phys. 26, 186 (1957).
T. Nielsen, A. Kaddani, and M. S. Benilov, J. Phys. D: Appl. Phys. 34, 2016 (2001).
V. Nemchinsky, J. Appl. Phys. 130, 103304 (2021).
K. Kutasi, P. Hartmann, and Z. Donkó, J. Phys. D: Appl. Phys. 34, 3368 (2001).
K. Kutasi, P. Hartmann, G. Bánó, and Z. Donkó, Plasma Sources Sci. Technol. 14, S1 (2005).
E. A. Bogdanov, K. D. Kapustin, A. A. Kudryavtsev, and A. S. Chirtsov, Tech. Phys. 55, 1430 (2010).
Q. Wang, D. J. Economou, and V. M. Donnelly, J. Appl. Phys. 100, 023301 (2006).
R. Deloche, P. Monchicourt, M. Cheret, and F. Lambert, Phys. Rev. A: At., Mol., Opt. Phys. 13, 1140 (1976).
A. I. Saifutdinov, A. R. Sorokina, V. K. Boldysheva, E. R. Latypov, and A. A. Saifutdinova, High Energy Chem. 56, 477 (2022).
A. R. Mansour and K. Hara, J. Phys. D: Appl. Phys. 52, 105204 (2019).
A. Bogaerts, R. Gijbels, and R. Carman, Spectrochim. Acta, Part B 53, 1679 (1998).
A. Bogaerts and R. Gijbels, J. Appl. Phys. 92, 6408 (2002).
Funding
This research was supported by the Russian Science Foundation, project no. 22-22-20099, https://rscf.ru/project/22-22-20099/.
Author information
Authors and Affiliations
Corresponding author
Ethics declarations
The authors declare that they have no conflicts of interest.
Additional information
Publisher’s Note.
Pleiades Publishing remains neutral with regard to jurisdictional claims in published maps and institutional affiliations.
Rights and permissions
About this article
Cite this article
Saifutdinov, A.I., Germanov, N.P., Sorokina, A.R. et al. Numerical Analysis of the Influence of Evaporation of the High- and Low-Melting-Point Anode Materials on Parameters of a Microarc Discharge. Plasma Phys. Rep. 49, 1187–1198 (2023). https://doi.org/10.1134/S1063780X23601104
Received:
Revised:
Accepted:
Published:
Issue Date:
DOI: https://doi.org/10.1134/S1063780X23601104