Abstract
Plasma discharge is a novel disinfection and effectual inactivation approach to treat microorganisms in aqueous systems. Inactivation of Gram-negative Escherichia coli (E. coli) by generating high-frequency, high-voltage, oxygen (O2) injected and hydrogen peroxide (H2O2) added discharge in water was achieved. The effect of H2O2 dose and oxygen injection rate on electrical characteristics of discharge and E. coli disinfection has been reported. Microbial log reduction dependent on H2O2 addition with O2 injection was observed. The time variation of the inactivation efficiency quantified by the log reduction of the initial E. coli population on the basis of optical density measurement was reported. The analysis of emission spectrum recorded after discharge occurrence illustrated the formation of oxidant species (OH•, H, and O). Interestingly, the results demonstrated that O2 injected and H2O2 added, underwater plasma discharge had fabulous impact on the E. coli sterilization. The oxygen injection notably reduced the voltage needed for generating breakdown in flowing water and escalated the power of discharge pulses. No impact of hydrogen peroxide addition on breakdown voltage was observed. A significant role of oxidant species in bacterial inactivation also has been identified. Furthermore the E. coli survivability in plasma treated water with oxygen injection and hydrogen peroxide addition drastically reduced to zero. The time course study also showed that the retardant effect on E. coli colony multiplication in plasma treated water was favorable, observed after long time. High-frequency underwater plasma discharge based biological applications is technically relevant and would act as baseline data for the development of novel antibacterial processing strategies.
Similar content being viewed by others
References
Y. C. Hong, H. J. Park, B. J. Lee, W. S. Kang, and H. S. Uhm, Phys. Plasmas 17, 053501 (2010).
R. Zhang, L. Wang, Y. Wu, Z. Guan, and Z. Jia, IEEE Trans. Plasma Sci. 34, 1370 (2006).
C. H. Wang, Y. Wu, and G. F. Li, J. Electrostat. 66, 71 (2008).
D. Ziuzina, S. Patil, P. J. Cullen, K. M. Keener, and P. Bourke, J. Appl. Microbiol. 114, 778 (2013).
P. Sunka, V. Babicky, M. Clupek, P. Lukes, M. Simek, J. Schmidt, and M. Cernak, Plasma Sources Sci. Technol. 8, 258 (1999).
I. Z. Kozakova, Ph. D. Thesis (Brno University of Technology, Brno, 2011).
M. Sato, Int. J. Plasma Environ. Sci. Technol. 3, 8 (2009).
S. H. R. Hosseini, S. Iwasaki, T. Sakugawa, and H. Akiyama, J. Korean Phys. Soc. 59, 3526 (2011).
M. W. Ahmed, J. K. Yang, Y. S. Mok, and H. J. Lee, J. Korean Phys. Soc. 65, 1404 (2014).
T. Izdebski, M. Dors, and J. Mizeraczyk, Eur. Chem. Bull. 3, 811 (2014).
B. Eliasson, M. Hirth, and U. Kogelschatz, J. Phys. D 20, 142 (1987).
R. Munter, Proc. Estonian Acad. Sci. Chem. 50, 59 (2001).
T. Sakoda, Y. Matsuda, and S. Baba, J. Plasma Fusion Res. SERIES 8, 623 (2009).
S. Pekarek, Acta Polytech. 43, 47 (2003).
A. Yamatake, H. Katayama, K. Yasuoka, and S. Ishii, Int. J. Plasma Environ. Sci. Technol. 1, 91 (2007).
M. Magureanu, C. Bradu, D. Piroi, N. B. Mandache, and V. Parvulescu, Plasma Chem. Plasma Proc. 33, 51 (2013).
B. R. Locke, M. Sato, P. Sunka, M. R. Hoffmann, and J. S. Chang, Ind. Eng. Chem. Res. 45, 882 (2006).
P. Lukes, M. Clupek, V. Babicky, V. Janda, and P. Sunka, J. Phys. D 38, 409 (2005).
J.-T. Marois-Fiset, A. Carabin, A. Lavoie, and C. C. Dorea, Appl. Environ. Microbiol. 79, 2107 (2013).
R. P. Joshi and S. M. Thagard. Plasma Chem. Plasma Process. 33, 1 (2013).
S. J. Kim, T. H. Chung, S. H. Bae, and S. H. Leem, Plasma Process. Polym. 6, 676 (2009).
M. Pekker and M. N. Shneider, J. Phys. D 48, 424009 (2015).
S. Reuter, J. Winter, S.Iseni, A. S. Bleker, M. Dunnbier, K. Masur, K. Wende, and K. D. Weltmann, IEEE Trans. Plasma Sci. 43, 3185 (2015).
S. Wani, J. K. Maker, J. R. Thompson, J. Barnes, and I. Singleton, Agriculture 5, 155 (2015).
A. P. Schuch, R. da S. Galhardo, K. M. de L. Bessa, N. J. Schuch, and C. F. M. Menck, Photochem. Photobiol. Sci. 8, 111 (2009).
R. P. Sinha, M. Dautz, and D. P. Hader, Acta Protozool. 40, 187 (2001).
M. Davoudi, T. Vakili, A. Absalan, M. H. Ehrampoushand, and M. T. Ghaneian, Middle-East J. Sci. Res. 13, 710 (2013).
P. Belenky, J. D. Ye, C. B. M. Porter, N. R. Cohen, M. A. Lobritz, T. Ferrante, S. Jain, B. J. Korry, E. G. Schwarz, G. C. Walker, and J. J. Collins, Cell Rep. 13, 1 (2015).
Oxygen Radicals in Biology and Medicine, Ed. by M. G. Simic, K. A. Taylor, J. F. Word, and C. von Sonntag (Plenium, New York, 1998).
B. A. Hamkalo and P. A. Swenson, J. Bacteriol. 99, 815 (1969).
H. Zuckerman, Y. E. Krasik, and J. Felsteiner, Innov. Food Sci. Emerg. Technol. 3, 3329 (2002).
S. V. Gudkov, O. E. Karp, S. A. Garmash, V. E. Ivanov, A. V. Chernikov, A. A. Manokhin, M. E. Astashev, L. S. Yaguzhinsky, and V. I. Bruskov, Mol. Biophys. 57, 1 (2012).
U. V. Gunten, Water Res. 37, 1443 (2003).
B. G. Kwon and J. H. Lee, Bull. Korean Chem. Soc. 27, 1785 (2006).
S. K. Dey, D. Banerjee, S. Chattapadhyay, and K. B. Karmakar, Int. J. Plasma Bio. Sci. 1 (3), 1 (2010).
E. Jeronsia, J. A. Joseph, and J. Das, Indian J. Dental Res. 5, 5707 (2015).
P. G. Mazzola, A. F. Jozala, L. C. de L. Novaes, P. Moriel, and T. C. V. Penna, Braz. J. Pharm. Sci. 45, 241 (2009).
J. K. Kim, N. Kim, and Y. H. Lim, J. Microbiol. Biotechnol. 20, 82 (2010).
R. Zhang, L. Wang, Y. Wu, Z. Guan, and Z. Jia, IEEE Trans. Plasma Sci. 34, 1370 (2006).
Y. C. Hong, H. J. Park, B. J. Lee, W. S. Kang, and H. S. Uhm, Phys. Plasmas. 17, 053502 (2010).
O. Zajic, in Proceedings of the Fourth International Water Technology Conference, Alexandria, 1999, p. 415.
I. V. Timoshkin, M. J. Given, M. P. Wilson, T. Wang, S. J. MacGregor, and N. Bonifaci, in Proceedings of the 22nd International Symposium on Plasma Chemistry, Antwerpen, 2015, Paper P-I-3-32.
J. M. Palomares, S. Hübner, E. A. D. Carbone, N. deVries, E. M. van Veldhuizen, A. Sola, A. Gamero, and J. J. A. M. van den Mullen, J. Phys. D 40, 5936 (2007).
H. R. Griem, Spectral Line Broadening by Plasmas (Academic, New York, 1974).
W. L. Wiese, D. E. Kelleher, and D. R. Paquette, Phys. Rev. A 6, 1132 (1972).
T. Shirafuji, T. Morita, O. Sakai, and K. Tachibana, in Proceedings of the 19th International Symposium on Plasma Chemistry, Bochum, 2009, Vol. 3, Paper P2.2.52.
J. Zhang, J. Chen, and X. Li, J. Water Resource Protect. 2, 99 (2009).
G. Eisenberg, Ind. Eng. Chem. Anal. Ed. 15, 327 (1943).
H. Bader, J. Hoigne, Water Res. 15, 449 (1981).
J. M. Montgomery, Water Treatment Principles and Design (Wiley, New York, 1985).
http://technologyinscience.blogspot.kr.
Author information
Authors and Affiliations
Corresponding author
Additional information
The article is published in the original.
Rights and permissions
About this article
Cite this article
Ahmed, M.W., Choi, S., Lyakhov, K. et al. High-frequency underwater plasma discharge application in antibacterial activity. Plasma Phys. Rep. 43, 381–392 (2017). https://doi.org/10.1134/S1063780X17030011
Received:
Accepted:
Published:
Issue Date:
DOI: https://doi.org/10.1134/S1063780X17030011