Abstract
The energy and spatial degradation of the primary beam electrons and the production of high-energy secondary electrons in ionizing collisions are analyzed by solving the Boltzmann integral equation for the electron distribution function. The effect of the primary and secondary electrons on the direct ionization of an Ar-SiH4 mixture, the production of metastable argon atoms, and the dissociation of monosilane molecules is investigated over a wide range of the beam electron energies, argon pressures, and monosilane concentrations. The influence of metastable Ar* atoms on the dissociation of SiH4 is studied by using the balance equation for metastable argon atoms and the equation for the ambipolar diffusion of ions and low-energy secondary (plasma) electrons in the beam plasma. It is shown that the main contribution to the activation of an Ar-SiH4 mixture in an electron-beam plasma is provided by secondary electrons with energies higher than the excitation threshold for argon and the dissociation threshold for monosilane, whereas the contribution from metastable argon atoms, though potentially being comparable with that from secondary electrons, is less than in gas-discharge plasmas.
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References
A. Matsuda, Jpn. J. Appl. Phys. 43, 7909 (2004).
R. A. Street, Phys. Status Solidi A 166, 695 (1998).
M. J. Kushner, J. Appl. Phys. 63, 2532 (1988).
S. Pfau and R. Winkler, Contrib. Plasma Phys. 30, 587 (1990).
J. Perrin, O. Leroy, and M. C. Bordage, Contrib. Plasma Phys. 36, 1 (1996).
L. Sansonnens, A. A. Howling, Ch. Hollenstein, et al., J. Phys. D 27, 1406 (1994).
D. Das, Thin Solid Films 476, 237 (2005).
R. G. Sharafutdinov, A. V. Skrinnikov, A. V. Parakhnevich, et al., J. Appl. Phys. 79, 7274 (1996).
R. G. Sharafutdinov, M. R. Baklanov, B. M. Ayupov, et al., Zh. Tekh. Fiz. 65(1), 181 (1995) [Tech. Phys. 40, 101 (1995)].
R. G. Sharafutdinov, S. Ya. Khmel, V. G. Shchukin, et al., Solar Energ. Mater. Solar Cells 89(2–3), 99 (2005).
J. L. Delcroix, C. M. Ferreira, and A. Ricard, in Principles of Laser Plasmas, Ed. by G. Bekefi (Wiley, New York, 1976; Énergoizdat, Moscow, 1982).
N. Baguer, A. Bogaerts, Z. Donko, et al., J. Appl. Phys. 97, 123 305 (2005).
A. Bogaerts and R. Gijbels, Phys. Rev. A 52, 3743 (1995).
E. A. Bogdanov, A. A. Kudryavtsev, L. D. Tsendin, et al., Zh. Tekh. Fiz. 74(6), 35 (2004) [Tech. Phys. 49, 698 (2004)].
J. Bretagne, J. Godart, and V. Puech, J. Phys. D: Appl. Phys. 15(11), 2205 (1982).
J. Bretagne, G. Delouya, J. Godart, and V. Puech, J. Phys. D 14, 1225 (1981).
V. P. Konovalov and É. E. Son, in Plasma Chemistry, Ed. by B. M. Smirnov (Atomizdat, Moscow, 1987), Vol. 14, p. 194 [in Russian].
A. V. Vasenkov, J. Phys. D 32, 240 (1999).
A. V. Vasenkov, R. G. Sharafutdinov, and A. V. Skrinnikov, J. Appl. Phys. 83, 3926 (1998).
A. V. Vasenkov, Phys. Rev. E 57, 2212 (1998).
A. V. Filippov, V. N. Babichev, N. A. Dyatko, et. al., Zh. Éksp. Teor. Fiz. 129, 386 (2006) [JETP 102, 342 (2006)].
A. Yanguas-Gil, J. Cortino, and L. L. Alves, J. Phys. D 38, 1588 (2005).
C. B. Opal, W. K. Peterson, and E. C. Beaty, J. Chem. Phys. 55, 4100 (1971).
W. L. Morgan, Plasma Chem. Plasma Process. 12, 477 (1992).
M. Kurachi and Y. Nakamura, J. Phys. D 22, 107 (1989).
E. Krishnakumar and S. K. Srivastava, Contrib. Plasma Phys. 35, 395 (1995).
G. I. Sukhinin, Doctoral Dissertation (Institute of Thermal Physics, Siberian Branch, Russian Academy of Sciences, Novosibirsk, 1997).
Y.-J. Shiu and M. A. Biondi, Phys. Rev. A 17, 868 (1978).
E. W. McDaniel and E. A. Mason, The Mobility and Diffusion of Ions in Gases (Wiley, New York, 1973; Mir, Moscow, 1976).
J. B. Boffard, G. A. Piech, M. F. Gerke, et al., Phys. Rev. A 59, 2749 (1999).
A. J. Dixon, M. F. A. Harrison, and A. C. H. Smith, in Proceedings of the 8th International Conference on Photonic, Electronic and Atomic Collisions, Belgrade, 1973, p. 405.
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Original Russian Text © G.I. Sukhinin, A.V. Fedoseev, S.Ya. Khmel’, 2008, published in Fizika Plazmy, 2008, Vol. 34, No. 1, pp. 66–77.
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Sukhinin, G.I., Fedoseev, A.V. & Khmel’, S.Y. Role of secondary electrons and metastable atoms in the electron-beam activation of argon-silane mixtures. Plasma Phys. Rep. 34, 60–70 (2008). https://doi.org/10.1134/S1063780X08010078
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DOI: https://doi.org/10.1134/S1063780X08010078