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Negative differential conductivity of metal-insulator-metal tunneling structures

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Abstract

The tunneling characteristics of a metal-insulator-metal junction are calculated in the framework of the two-band model, which takes into account the presence of the valence band for the insulator layer. It is demonstrated that, in the case where the Fermi level E F of the structure under investigation lies below the middle of the band gap of the insulator, the dependence of the tunneling current on the bias voltage across the junction contains portions with a negative differential resistance at V > E F/e. The iron-aluminum oxide-iron magnetoresistive junctions are considered as samples in which the effect under discussion can be observed. It is shown that, in the given case, the appearance of a portion with a negative differential resistance should be expected at voltages exceeding the Fermi energy \( E_{F_1 } \) for the spin-up electron band.

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Correspondence to A. I. Khachaturov.

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Original Russian Text © T.A. Khachaturova, A.I. Khachaturov, 2008, published in Zhurnal Éksperimental’noĭ i Teoreticheskoĭ Fiziki, 2008, Vol. 134, No. 5, pp. 1006–1012.

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Khachaturova, T.A., Khachaturov, A.I. Negative differential conductivity of metal-insulator-metal tunneling structures. J. Exp. Theor. Phys. 107, 864–869 (2008). https://doi.org/10.1134/S1063776108110174

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  • DOI: https://doi.org/10.1134/S1063776108110174

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