Abstract
The localization of atoms in a deep optical potential is analyzed in the framework of the completely quantum description of the motion of the atoms using the kinetic equation for the density matrix. It is shown that the laser cooling of the neutral atoms in the deep optical potential at a relatively large detuning of the light field from resonance can be used as a method for forming spatially localized atomic structures with a high contrast for atomic lithography. This method is alternative to nondissipative light masks.
Similar content being viewed by others
References
D. Meschede and H. Metcalf, J. Phys. D: Appl. Phys. 36, R17 (2003).
M. K. Oberthaler and T. Pfau, J. Phys.: Condens. Matter 15, R233 (2003).
J. J. McClelland and M. R. Scheinfein, J. Opt. Soc. Am. B 8, 1974 (1991).
A. P. Kazantsev, G. I. Surdutovich, and V. P. Yakovlev, Mechanical Action of Light on Atoms (World Sci., Singapore, 1990; Nauka, Moscow, 1991).
R. Stutzle, D. Jurgens, A. Habenicht, and M. K. Oberthaler, J. Opt. B: Quantum Semiclassic. Opt. 5, S164 (2003).
O. N. Prudnikov and E. Arimondo, J. Opt. B: Quantum Semiclassic. Opt. 6, 336 (2004).
D. J. Wineland and W. M. Itano, Phys. Rev. A 20, 1521 (1979).
J. Dalibard and C. Cohen-Tannoudji, J. Opt. Soc. Am. B 6, 2023 (1989).
S. M. Yoo and J. Javanainen, Phys. Rev. A 45, 3071 (1992).
Y. Castin and J. Dalibard, Europhys. Lett. 14, 761 (1991).
K. Berg-Sorensen, Y. Castin, K. Molmer, and J. Dalibard, Europhys. Lett. 22, 663 (1993).
J. Guo and P. Berman, Phys. Rev. A 48, 3225 (1993).
Y. Castin, K. Berg-Sorensen, J. Dalibard, and K. Molmer, Phys. Rev. A 50, 5092 (1994).
I. H. Deutsch, J. Grondalski, and P. M. Alsing, Phys. Rev. A 56, R1705 (1997).
M. Gatzke, G. Birkl, P. S. Jessen, et al., Phys. Rev. A 55, R3987 (1997).
S. Marksteiner, R. Walser, P. Marte, and P. Zoller, Appl. Phys. B 60, 145 (1995).
P. S. Jessen, C. Gerz, P. D. Lett, et al., Phys. Rev. Lett. 69, 49 (1992).
G. Raithel, G. Birkl, A. Kastberg, et al., Phys. Rev. Lett. 78, 630 (1997).
B. J. Feldman and M. S. Feld, Phys. Rev. A 5, 899 (1972).
S. Stenholm, Phys. Rep. 43, 151 (1978).
S. A. Babin, D. V. Churkin, E. V. Podivilov, et al., Phys. Rev. A 67, 043808 (2003).
V. G. Minogin and O. T. Serimaa, Opt. Commun. 3, 373 (1979).
S. M. Tan, J. Opt. B: Quantum Semiclassic. Opt. 1, 424 (1999).
S. M. Yoo and J. Javanainen, J. Opt. Soc. Am. B 8, 1341 (1991).
Author information
Authors and Affiliations
Additional information
Original Russian Text © O.N. Prudnikov, A.V. Taĭchenachev, A.M. Tumaĭkin, V.I. Yudin, 2007, published in Zhurnal Éksperimental’noĭ i Teoreticheskoĭ Fiziki, 2007, Vol. 131, No. 6, pp. 963–970.
Rights and permissions
About this article
Cite this article
Prudnikov, O.N., Taĭchenachev, A.V., Tumaĭkin, A.M. et al. Dissipative light mask generated by a nonuniformly polarized field for atomic lithography. J. Exp. Theor. Phys. 104, 839–845 (2007). https://doi.org/10.1134/S1063776107060015
Received:
Issue Date:
DOI: https://doi.org/10.1134/S1063776107060015