Abstract
Islands in the form of truncated triangular pyramids on the surface of an epitaxial Ge3Sb2Te6 layer grown on a Si(111) substrate are identified by scanning electron microscopy. It is established that sides of their bases are oriented along the Si〈110〉 directions, and sizes vary from several tens to several hundred nanometers. It is shown by high-resolution electron microscopy of cross-sectional specimens that the (111) planes of the cubic phase or (0001) planes of the hexagonal phase of Ge3Sb2Te6 in the epitaxial layer are oriented parallel to Si(111) and, in surface domains, can make an angle of 70.5° with the layer–substrate interface. It is established, using an atomic structure analysis and energy-dispersive X-ray microanalysis, that the composition in islands changes from Ge3Sb2Te6 to GeSb2Te4 along the growth direction.
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ACKNOWLEDGMENTS
This study was performed on the equipment of the Collective-Use Center “Diagnostics and Modification of Microstructures and Nanoobjects”.
Funding
This study was supported by the Ministry of Science and Higher Education of the Russian Federation (subject AAAA-A20-120071490069-9, agreement no. 075-03-2020-216, code 0719-2020-0018).
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Translated by A. Sin’kov
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Zaytseva, Y.S., Borgardt, N.I., Prikhodko, A.S. et al. Electron Microscopy Study of Surface Islands in Epitaxial Ge3Sb2Te6 Layer Grown on a Silicon Substrate. Crystallogr. Rep. 66, 687–693 (2021). https://doi.org/10.1134/S1063774521030317
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DOI: https://doi.org/10.1134/S1063774521030317