Abstract
Samples of CZ n-Si〈Zn〉(111) are prepared by high-temperature zinc-diffusion annealing followed by quenching and are studied by X-ray diffraction. The silicon contains an initial phosphorus impurity and zinc-compensating admixture at concentrations N P = 1.5 × 1014 cm−3 and N Zn = 1 × 1014 cm−3; i.e., the relation N P/2 < N Zn < N P is fulfilled. Microdefects are studied by double- and triple-crystal X-ray diffraction in the dispersion free modes (n, −n) and (n, −n, +n). The samples are found to contain microdefects with two characteristic sizes (average sizes of about 1 μm and 70 nm). The interplanar distance in the near-surface layer with a thickness of 0.1 μm is smaller than this parameter in the remaining matrix, the difference being equal to d 0 Δd/d 0 ≈ 2 × 10−5. This layer contains mainly vacancy-type microdefects. The angle between the reflecting planes and the local surface relief is Δψ = (7 ± 1) arcmin.
Similar content being viewed by others
References
H. Willebrand, Yu. Astrov, L. Portsel, S. Teperick, and T. Gauselmann, IR Phys. Technol. 36, 809 (1995).
N. Sclar, Solid State Electron. 24, 203 (1981).
H. Lemke, Phys. Status Solidi (a) 72, 177 (1982).
L. S. Berman and A. A. Lebedev, Deep-Level Transient Spectroscopy of Semiconductors (Nauka, Leningrad, 1981) [in Russian].
A. Dornen, R. Kuenle, K. Thonke, P. Stolz, G. Pensl, and D. Grunnebaum, Phys. Rev. B, 40, 12005 (1989).
H. Bracht, N. A. Stolwijk, and H. Mehrer, Phys. Rev. B, 52, 16542 (1995).
B. I. Boltaks, Diffusion and Point Defects in Semiconductors (Nauka, Leningrad, 1972) [in Russian].
E. B. Yakimov and V. V. Privezentsev, J. Mater. Sci.: Mater. Electron. 19, S277 (2008).
A. A. Lomov, V. A. Bushuev, V. A. Karavanskii, and S. Beiliss, Crystallogr. Rep. 48, 326 (2003).
A. M. Afanas’ev, P. A. Aleksandrov, and R. M. Imamov, X-ray Diffraction Diagnostics of Submicron Layers (Nauka, Moscow, 1989) [in Russian].
P. H. Dederichs, J. Phys. F, 3, 471 (1973).
M. A. Krivoglaz, Diffraction of X rays and Neutrons in Nonideal Crystals (Naukova Dumka, Kiev, 1983) [in Russian].
K. D. Shcherbachev and V. T. Bublik, Zavod. Lab. 60,473 (1994).
A. G. Milnes, Deep Impurities in Semiconductors (Wiley, New York, 1973).
V. V. Privezentsev. Techn. Progr. of the XIII Intern. Conf. DRIP, Wheeling, West Virginia, USA, 2009, p. 9; http://www.tms.org/Meetings/Specialty/drip09.
Author information
Authors and Affiliations
Corresponding author
Rights and permissions
About this article
Cite this article
Privezentsev, V.V. X-ray diffraction study of defects in zinc-diffusion-doped silicon. Crystallogr. Rep. 58, 963–969 (2013). https://doi.org/10.1134/S1063774513070134
Received:
Published:
Issue Date:
DOI: https://doi.org/10.1134/S1063774513070134