Abstract
The probe and spectral measurements of the plasma of the BCl3–Cl2 gas medium are carried out. Data are obtained on the influence of the initial composition of the gas medium on the electric field strength, gas temperature, particle concentration, and reduced electric field strength under conditions of a direct current glow discharge. The emission spectra of the plasma of the BCl3–Cl2 gas medium are analyzed, the main emitting components are identified, and the relationships between radiation intensities and particle concentrations are established.
This is a preview of subscription content, log in via an institution to check access.
REFERENCES
Van Roosmalen, A.J., Baggerman, J.A.G., and Brader, S.J.H., Dry Etching for VLSI, Updates in Applied Physics and Electrical Engineering, New York: Springer, 1991. https://doi.org/10.1007/978-1-4899-2566-4
Rooth, J.R., Industrial Plasma Engineering, Philadelphia: IOP Publishing, 1995.
Efremov, A.M. and Murin, D.B., Parameters of plasma and mechanisms of etching of metals and semiconductors in HCl + Ar, H2, O2, and Cl2 mixtures, Russ. Microelectron., 2015, vol. 44, no. 5, pp. 297–303. https://doi.org/10.1134/s1063739715040046
Ivanov, Yu.A., Lebedev, Yu.A., and Polak, L.S., Metody kontaktnoi diagnostiki v neravnovesnoi plazmokhimii (Methods of Contact Diagnostics in Nonequilibrium Plasmachemistry), Moscow: Nauka, 1981.
Rokhlin, G.N., Razryadnye istochniki sveta (Discharge Light Sources), Moscow: Energatomizdat, 1991, 2nd ed.
Murin, D.B. and Dunaev, A.V., Electrophysical parameters and radiation spectra of boron trichloride plasma, Russ. Microelectron., 2018, vol. 47, no. 2, pp. 95–103. https://doi.org/10.1134/s1063739718020075
Pearse, R.W.B. and Gaydon, A.G., The Identification of Molecular Spectra, New York: Wiley, 1976.
Striganov, A.R. and Sventitskii, N.S., Tablitsy spektral’nykh linii neitral’nykh i ionizirovannykh atomov (Tables of Spectral Lines of Neutral and Ionized Atoms), Moscow: Atomizdat, 1966.
Dunaev, A.V. and Murin, D.B., Electrophysical parameters and concentrations of active particles in the plasma of HCl mixtures with inert and molecular gases, Russ. Microelectron., 2014, vol. 43, no. 5, pp. 352–357. https://doi.org/10.1134/s1063739714050035
Efremov, A.M. and Murin, D.B., Electrophysical parameters and emission spectra of glow discharge in HCl + Ar, He, H2, O2, and Cl2, Izv. Vyssh. Uchebn. Zaved. Ser.: Khim. Khim. Tekhnol., 2015, vol. 58, no. 4, pp. 14–18.
Efremov, A.M., Pivovarenok, S.A., and Svettsov, V.I., Plasma parameters and etching mechanisms of metals and semiconductors in hydrogen chloride, Russ. Microelectron., 2009, vol. 38, no. 3, pp. 147–159. https://doi.org/10.1134/s1063739709030019
Efremov, A.M., Svettsov, V.I., and Sitanov, D.V., The parameters of plasma and the kinetics of generation and loss of active particles under conditions of discharge in chlorine, High Temp., 2008, vol. 46, no. 1, pp. 11–18. https://doi.org/10.1134/s10740-008-1003-4
Funding
This work was supported by ongoing institutional funding. No additional grants to carry out or direct thisparticular research were obtained.
Author information
Authors and Affiliations
Corresponding author
Ethics declarations
The authors of this work declare that they have no conflicts of interest.
Additional information
Publisher’s Note.
Pleiades Publishing remains neutral with regard to jurisdictional claims in published maps and institutional affiliations.
Rights and permissions
About this article
Cite this article
Murin, D.B., Chesnokov, I.A., Gogulev, I.A. et al. Probe and Spectral Diagnostics of the Plasma of the BCl3–Cl2 Gas Medium. Russ Microelectron 52, 469–474 (2023). https://doi.org/10.1134/S1063739723700701
Received:
Revised:
Accepted:
Published:
Issue Date:
DOI: https://doi.org/10.1134/S1063739723700701