Abstract
The formation of thin films of indium antimonide on Si(111) from a stoichiometric mixture with a thickness of 32–48 nm was performed by solid-phase epitaxy (SPE) at a temperature of 320–380°C under ultrahigh vacuum conditions. It is shown that the use of an array of high-density InSb seed islands makes it possible to form a large-block epitaxial InSb film, while a solid-phase epitaxy from a mixture deposited on a clean surface produces a granular polycrystalline film. Based on the analysis of low energy electron diffraction patterns, X-ray diffraction data and Raman spectra, the stresses in the resulting films were determined: in the out of plane direction the films are weakly compressed by 0.1–0.14% while in the in-plane direction the epitaxial film is compressed by 1.33%. Thus, we show the possibility of forming practically relaxed InSb epitaxial films on Si(111) without the use of buffer of extraneous chemical elements.
REFERENCES
Hopkinson, M., Martin, T., and Smowton, P., Semicond. Sci. Technol., 2013, vol. 28, p. 090301. https://doi.org/10.1088/0268-1242/28/9/090301
Riel, H., Proc. Silicon Nanoelectronics Workshop, 2017, p. 1. https://doi.org/10.23919/SNW.2017.8242267
Levinštejn, M.E., Handbook Series on Semiconductor Parameters, Singapore: World Sci., 1996.
Boltar, K.O., Iakovleva, N.I., Lopukhin, A.A., and Vlasov, P.V., J. Commun. Technol. Electron., 2023, vol. 68, p. 316. https://doi.org/10.1134/S106422692303004X
Mu, Q., Fan, F., Chen, S., Xu, S., Xiong, C., Zhang, X., Wang, X., and Chang, S., Photonics Res., 2019, vol. 7, p. 325. https://doi.org/10.1364/PRJ.7.000325
Jankowski, J., Prokopowicz, R., Pytel, K., and El-Ahmar, S., IEEE Trans. Nucl. Sci., 2019, vol. 66, p. 926. https://doi.org/10.1109/TNS.2019.2912720
Chen, Y., Huang, S., Pan, D., Xue, J., Zhang, L., Zhao, J., and Xu, H.Q., npj 2D Mater Appl., 2021, vol. 5, p. 3. https://doi.org/10.1038/s41699-020-00184-y
Rao, B.V., Gruznev, D., Tambo, T., and Tatsuyama, C., Semicond. Sci. Technol., 2001, vol. 16, p. 216. https://doi.org/10.1088/0268-1242/16/4/305
Liu, W.K., Winesett, J., Ma, W., Zhang, X., Santos, M.B., Fang, X.M., and McCann, P.J., J. Appl. Phys., 1997, vol. 81, p. 1708. https://doi.org/10.1063/1.364028
Farag, A.A.M., Ashery, A., and Terra, F.S., Microelectron. J., 2008, vol. 39, p. 253. https://doi.org/10.1016/j.mejo.2007.10.029
Rao, B.V., Okamoto, T., Shinmura, A., Gruznev, D., Mori, M., Tambo, T., and Tatsuyama, C., Appl. Surf. Sci., 2000, vols. 159–160, p. 335. https://doi.org/10.1016/S0169-4332(00)00074-X
Khamseh, S., Yasui, Y., Nakayama, K., Nakatani, K., Mori, M., and Maezawa, K., Jpn. J. Appl. Phys., 2011, vol. 50, p. 04DH13. https://doi.org/10.1143/JJAP.50.04DH13
Chyi, J.-I., Biswas, D., Iyer, S.V., Kumar, N.S., Morkoç, H., Bean, R., Zanio, K., H.-Y. Lee, and Chen, H., Appl. Phys. Lett., 1989, vol. 54, p. 1016. https://doi.org/10.1063/1.100784
Rao, B.V., Gruznev, D., Tambo, T., and Tatsuyama, C., J. Crystal Growth, 2001, vol. 224, p. 316. https://doi.org/10.1016/S0022-0248(01)01018-1
Chusovitina, S.V., Subbotin, E.Y., Chusovitin, E.A., Goroshko, D.L., Dotsenko, S.A., Pyachin, S.A., Gerasimenko, A.V., and Gutakovskii, A.K., Jpn. J. Appl. Phys., 2023, vol. 62, p. SD1005. https://doi.org/10.35848/1347-4065/aca4d8
Goroshko, D., Chusovitin, E., Subbotin, E., and Chusovitina, S., Semicond. Sci. Technol., 2020, vol. 35, p. 10LT01. https://doi.org/10.1088/1361-6641/aba0ca
Hirayama, H., Baba, S., and Kinbara, A., Appl. Surf. Sci., 1988, vols. 33–34, p. 193. https://doi.org/10.1016/0169-4332(88)90306-6
Bolmont, D., Chen, P., Sébenne, C.A., and Proix, F., Surf. Sci., 1984, vol. 137, p. 280. https://doi.org/10.1016/0039-6028(84)90689-7
Paliwal, V.K., Vedeshwar, A.G., and Shivaprasad, S.M., Pure Appl. Chem., 2002, vol. 74, p. 1651. https://doi.org/10.1351/pac200274091651
Shivaprasad, S.M., Paliwal, V.K., and Chaudhuri, A., Appl. Surf. Sci., 2004, vol. 237, p. 93. https://doi.org/10.1016/j.apsusc.2004.06.082
Zotov, A.V., Lifshits, V.G., Ditina, Z.Z., and Kalinin, P.A., Surf. Sci., 1992, vol. 273, p. L453. https://doi.org/10.1016/0039-6028(92)90269-c
Kiefer, W., Richter, W., and Cardona, M., Phys. Rev. B, 1975, vol. 12, p. 2346. https://doi.org/10.1103/PhysRevB.12.2346
Kreutz, E.W., Rickus, E., and Sotnik, N., Surf. Technol., 1980, vol. 11, p. 171. https://doi.org/10.1016/0376-4583(80)90044-8
Liu, J. and Zhang, T., Appl. Surf. Sci., 1998, vol. 126, p. 231. https://doi.org/10.1016/S0169-4332(97)00695-8
Siethoff, H., Phys. Lett. A, 1979, vol. 71, p. 265. https://doi.org/10.1016/0375-9601(79)90182-8
Yang, W.S. and Zhao, R.G., Phys. Rev. Lett., 1986, vol. 56, p. 2877. https://doi.org/10.1103/PhysRevLett.56.2877
Nakada, T. and Osaka, T., Phys. Rev. Lett., 1991, vol. 67, p. 2834. https://doi.org/10.1103/PhysRevLett.67.2834
Aoki, K., Anastassakis, E., and Cardona, M., Phys. Rev. B, 1984, vol. 30, p. 681. https://doi.org/10.1103/PhysRevB.30.681
Anastassakis, E., J. Raman Spectrosc., 1981, vol. 10, p. 64. https://doi.org/10.1002/jrs.1250100112
Martin, R.M., Phys. Rev. B, 1970, vol. 1, p. 4005. https://doi.org/10.1103/PhysRevB.1.4005
ACKNOWLEDGMENTS
The authors are grateful to the Far Eastern Center of Structural Studies for performing the XRD investigation.
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This work was partially supported by the funding of the Ministry of Education and Science of the Russian Federation project no. 0202-2021-0002.
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Goroshko, D.L., Chusovitina, S.V., Dotsenko, S.A. et al. Formation of Thin Films of InSb on Pristine and Modified Si(111) Using Solid Phase Epitaxy. Bull. Russ. Acad. Sci. Phys. 87 (Suppl 1), S29–S35 (2023). https://doi.org/10.1134/S1062873823704543
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DOI: https://doi.org/10.1134/S1062873823704543