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Deposition of TiAlN Thin Films by Magnetron Discharge Plasma

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Abstract

In this paper, the effects of nitrogen flow rate on the physical and chemical properties of TiAlN thin films deposited from magnetron discharge plasma at different power modes have been investigated. A mixed Ti0.5Al0.5 target (50/50 at % element content) was mounted on the magnetron. Stainless steel and silicon wafers were used as substrates. The TiAlN films were obtained by magnetron sputtering with a constant argon flow (0.725 cm3/s). Two groups of TiAlN coatings were obtained at different magnetron powers. For the first and second groups, the power of the magnetron was 1.5 and 1 kW, respectively. A nitrogen flow for each group of samples varied from 0.125 to 0.5 cm3/s in 0.125 cm3/s increments. Changes in the surface morphology, microstructure, nanohardness, and content of Ti, Al, and N in the obtained films (in at %) were studied. The measurements were performed on an S-3400N SEM, a CSM Instruments hardness tester, and Zeiss Supra 55 (In-Lens detector type, electron energy of 10 keV) with a Raith150 Two electron-beam exposure unit.

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Funding

The work was supported financially by the Ministry of Science and Higher Education of the Russian Federation under contract no. 075-03-2020-237/1 dated March 5, 2020 (project number FVVM-2020-0040).

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Authors and Affiliations

  1. Tomsk Polytechnic University, 634050, Tomsk, Russia

    A. I. Fedorov & A. V. Yurjeva

  2. Zuev Institute of Atmospheric Optics of Siberian Branch of the Russian Academy of Sciences, 634055, Tomsk, Russia

    Yu. N. Yurjev & A. I. Kazimirov

  3. Tomsk State University of Control Systems and Radioelectronics (TUSUR), 634050, Tomsk, Russia

    Yu. N. Yurjev

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  1. A. I. Fedorov
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  2. Yu. N. Yurjev
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  3. A. I. Kazimirov
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  4. A. V. Yurjeva
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Correspondence to Yu. N. Yurjev.

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Fedorov, A.I., Yurjev, Y.N., Kazimirov, A.I. et al. Deposition of TiAlN Thin Films by Magnetron Discharge Plasma. J. Surf. Investig. 17 (Suppl 1), S121–S127 (2023). https://doi.org/10.1134/S1027451023070121

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