Abstract
We study the effect of low-energy ion bombardment on the texture and structure of an 80-nm-thick platinum film deposited at room temperature. The film is treated in an inductively coupled Ar plasma with a negative voltage of 45–125 V applied to the samples and an ion-current density of 3.3 mA/cm2. A series of treatments at each voltage results in thinning of the film; after each treatment, its structural parameters are determined by X-ray diffraction analysis and compared with the parameters of Pt films 20–60 nm thick deposited under the same conditions. The treatment at 75–125 V decreases the average size of the coherently diffracting domains by 10–25%; at 45 V, such a decrease is not observed. The results are explained by the formation and accumulation of radiation defects; the rate of their formation is lower at 45 V. Film sputtering in all modes does not worsen the sharpness of the film texture.
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Funding
X-ray and microscopic studies were carried out using equipment of the Facilities Sharing Center “Diagnostics of Microstructures and Nanostructures” with financial support of the Ministry of Science and Higher Education of the Russian Federation. The investigation was supported by program no. FFNN-0022-0018 of the Ministry of Science and Higher Education of Russia for Valiev Institute of Physics and Technology, Russian Academy of Sciences.
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Selyukov, R.V., Naumov, V.V., Izyumov, M.O. et al. Effect of Low-Energy Ion Bombardment on the Texture and Microstructure of Platinum Films. J. Surf. Investig. 17, 180–186 (2023). https://doi.org/10.1134/S1027451023010366
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DOI: https://doi.org/10.1134/S1027451023010366