Abstract
A method providing more than a tenfold improvement in the precision of exposure field alignment in electron-beam lithography is proposed. The method uses a scanning electron microscope with a standard mechanical positioning system and alignment markers produced by contact photolithography. Bragg–Fresnel lens (1–3–5 orders) with a tenfold decrease in the error of exposure field alignment through the use of mechanical stages are created via this technique.
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O. DialI, C. C. A. Cheng, and A. Scherer, J. Vac. Sci. Technol., B: Microelectron. Nanometer Struct. 16 (6), 3887 (1998).
An. Firsov, A. Firsov, B. Loechel, et al., Opt. Express 22 (23), 28756 (2014).
A. Firsov, V. Aristov, A. Asryan, et al., Nucl. Instrum. Methods Phys. Res., Sect. A 467–468, 366 (2001).
A. Firsov, A. Svintsov, A. Firsova, et al., Nucl. Instrum. Methods Phys. Res., Sect. A 399, 152 (1977).
X. Huang, H. Yan, E. Et. Nazaretsk, et al., Sci. Rep. 3, 3562 (2013).
S. Niese, P. Kruger, A. Kubec, et al., Opt. Express 22 (17), 20008 (2014).
O. Hignette, P. Cloetens, C. Morawe, et al., AIP Conf. Proc. 879, 792 (2007).
H. Mimura, S. Handa, T. Kimura, et al., Nat. Phys. 6, 122 (2010).
A. G. Michette, S. J. Pfauntsch, A. Erko, et al., Opt. Commun. 245, 249 (2005).
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Original Russian Text © M.A. Knyazev, A.A. Svintsov, R.R. Fahrtdinov, 2018, published in Poverkhnost’, 2018, No. 10, pp. 26–29.
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Knyazev, M.A., Svintsov, A.A. & Fahrtdinov, R.R. Development of Field Alignment Methods for Electron-Вeam Lithography in the Case of X-Ray Bragg–Fresnel Lenses. J. Surf. Investig. 12, 957–960 (2018). https://doi.org/10.1134/S1027451018050270
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DOI: https://doi.org/10.1134/S1027451018050270