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Development of Field Alignment Methods for Electron-Вeam Lithography in the Case of X-Ray Bragg–Fresnel Lenses

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Abstract

A method providing more than a tenfold improvement in the precision of exposure field alignment in electron-beam lithography is proposed. The method uses a scanning electron microscope with a standard mechanical positioning system and alignment markers produced by contact photolithography. Bragg–Fresnel lens (1–3–5 orders) with a tenfold decrease in the error of exposure field alignment through the use of mechanical stages are created via this technique.

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Correspondence to M. A. Knyazev.

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Original Russian Text © M.A. Knyazev, A.A. Svintsov, R.R. Fahrtdinov, 2018, published in Poverkhnost’, 2018, No. 10, pp. 26–29.

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Knyazev, M.A., Svintsov, A.A. & Fahrtdinov, R.R. Development of Field Alignment Methods for Electron-Вeam Lithography in the Case of X-Ray Bragg–Fresnel Lenses. J. Surf. Investig. 12, 957–960 (2018). https://doi.org/10.1134/S1027451018050270

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  • DOI: https://doi.org/10.1134/S1027451018050270

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