Abstract
The dependences of the sputtering coefficient on the types of accelerated ions, their energy, and the angle of incidence on a target are calculated. For Ar–Si, Хе–С, and H–W systems, acceptable coincidence between the calculated and experimental data is obtained. Two mechanisms for secondary-particle ejection from solids are established; they determine the dependences of the base sputtering coefficient for the base on the energy and the angle of primary ion incidence on the target.
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Original Russian Text © A.N. Pustovit, 2018, published in Poverkhnost’, 2018, No. 9, pp. 97–101.
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Pustovit, A.N. Emission Theory of Amorphous Material Sputtering: the Dependence of the Sputtering Coefficient on the Angle of Primary Ion Beam Incidence. J. Surf. Investig. 12, 918–922 (2018). https://doi.org/10.1134/S1027451018050142
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DOI: https://doi.org/10.1134/S1027451018050142