Abstract
Thin TiO x and VO2 – x films are fabricated via pulsed laser deposition from metal targets with the help of mask technologies. Their memristive properties are investigated using Au/TiOx1/TiOx2/Au and Au/VO2/VO2 – x/Au thin-film structures, and the possible mechanisms of resistive switching are discussed. The structures are obtained at room temperature in an oxygen atmosphere.
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Original Russian Text © O.A. Novodvorsky, L.S. Parshina, A.A. Lotin, V.A. Mikhalevsky, O.D. Khramova, E.A. Cherebylo, V.Ya. Panchenko, 2018, published in Poverkhnost’, 2018, No. 4.
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Novodvorsky, O.A., Parshina, L.S., Lotin, A.A. et al. Vanadium- and Titanium Dioxide-Based Memristors Fabricated via Pulsed Laser Deposition. J. Surf. Investig. 12, 322–327 (2018). https://doi.org/10.1134/S1027451018020313
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DOI: https://doi.org/10.1134/S1027451018020313