Abstract
The influence of heat treatment on the structure and electrical properties of Ni x (NbO)100–x thin films obtained by the ion-beam sputtering of a composite target is investigated. The composite structure is found to be formed during the deposition of Ni–NbO films and to contain a mixture of nanoscale face-centered cubic (fcc) Ni grains and amorphous niobium oxide. Annealing at 550°C leads to the crystallization of amorphous niobium oxide; however, the heterogeneity and nanoscale structure of composites are maintained.
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Original Russian Text © K.I. Semenenko, M.A. Kashirin, O.V. Stognei, A.D. Al-Maliki, 2016, published in Poverkhnost’, 2016, No. 10, pp. 98–103.
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Semenenko, K.I., Kashirin, M.A., Stognei, O.V. et al. Thermal stability, structure and phase composition of Ni x (NbO)100–x composites. J. Surf. Investig. 10, 1087–1091 (2016). https://doi.org/10.1134/S1027451016040157
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DOI: https://doi.org/10.1134/S1027451016040157