Abstract
A mathematical model of three-dimensional exciton-diffusion excited by a narrow electron beam in a semiconductor material is described and studied. It is shown that the obtained model can be used to estimate the exciton-diffusion coefficient in accordance with results of experimental time-of-flight measurements for samples coated with an opaque mask with circular holes. Parameters that are characteristic for GaN are used in the simulation.
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Original Russian Text © A.N. Polyakov, M.A. Stepovich, D.V. Turtin, 2015, published in Poverkhnost’. Rentgenovskie, Sinkhrotronnye i Neitronnye Issledovaniya, 2015, No. 12, pp. 48–52.
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Polyakov, A.N., Stepovich, M.A. & Turtin, D.V. Three-dimensional diffusion of excitons generated by an electron beam in a semiconductor material: Results of mathematical modeling. J. Surf. Investig. 9, 1251–1255 (2015). https://doi.org/10.1134/S1027451015060361
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DOI: https://doi.org/10.1134/S1027451015060361