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Features of the plasma sputtering of polycrystalline Pb1 − x Sn x S films

  • S. P. ZiminEmail author
  • E. S. Gorlachev
  • I. I. Amirov
  • V. V. Naumov
  • G. A. Dubov
  • V. F. Gremenok
  • I. N. Tsyrelchuk
Article

Abstract

The processes of the sputtering and modification of surfaces of polycrystalline films of the ternary solid solution Pb1 − x Sn x S (x = 0.9–1.0) in a high-density Ar plasma of high-frequency low-pressure inductive discharge are studied. Films with thicknesses of 1–4 μm are grown on glass substrates using the “hot-wall” method and consist of plate-like crystallites. It is established that the sputtering rate for lead-tin sulfide films does not exceed 2.0 nm/s, which is determined by the presence of oxygen-containing compounds on the surfaces. In the case of plate-like crystallites with nanodimensional thicknesses, the effect of smoothing of the developed surfaces of the polycrystalline Pb1 − x Sn x S layers during plasma treatment is observed; this is important for fabricating multilayer device structures.

Keywords

Plasma Treatment Neutron Technique Atomic Force Micro Surface Microrelief Ternary Solid Solution 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© Pleiades Publishing, Ltd. 2014

Authors and Affiliations

  • S. P. Zimin
    • 1
    Email author
  • E. S. Gorlachev
    • 1
    • 2
  • I. I. Amirov
    • 2
  • V. V. Naumov
    • 2
  • G. A. Dubov
    • 1
  • V. F. Gremenok
    • 3
    • 4
  • I. N. Tsyrelchuk
    • 4
  1. 1.Yaroslavl State UniversityYaroslavlRussia
  2. 2.Institute of Physics and Technology, Yaroslavl BranchRussian Academy of SciencesYaroslavlRussia
  3. 3.Scientific-Practical Material Research CenterNational Academy of Sciences of BelarusMinskBelarus
  4. 4.Belarus State University of Informatics and RadioelectronicsMinskBelarus

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