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Features of the manufacture of deep X-ray lithography masks in the siberian synchrotron and terahertz radiation center

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Abstract

The development of a low-cost technology to manufacture high-contrast X-ray LIGA masks is topical because this technology is important for various applied research on microstructured products with minimum element sizes of 10–50 μm, such as microfluid analytical systems, selective waveguide mesh-based elements to control terahertz (THz) radiation, microshaped optical elements for the visible range, etc. Technological particularities of mask manufacture are considered. A method to check the quality of masks is presented. Test microproducts manufactured using the produced deep X-ray lithography masks are demonstrated.

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Authors and Affiliations

  1. Budker Institute of Nuclear Physics, Siberian Branch, Russian Academy of Sciences, Novosibirsk, 630090, Russia

    B. G. Gol’denberg, A. Yu. Abramskii, V. I. Kondrat’ev, K. E. Kuper, E. V. Petrova & V. F. Pindyurin

  2. Institute of Solid State Chemistry and Mechanochemistry, Siberian Branch, Russian Academy of Sciences, Novosibirsk, 630128, Russia

    A. G. Zelinskii & A. I. Maslii

  3. Nikolaev Institute of Inorganic Chemistry, Siberian Branch, Russian Academy of Sciences, Novosibirsk, 630090, Russia

    E. A. Maksimovskii

  4. Institute of Automatics and Electrometry, Siberian Branch, Russian Academy of Sciences, Novosibirsk, 630090, Russia

    V. P. Korol’kov

Authors
  1. B. G. Gol’denberg
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  2. A. Yu. Abramskii
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  3. A. G. Zelinskii
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  4. A. I. Maslii
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  5. E. A. Maksimovskii
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  6. V. I. Kondrat’ev
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  7. V. P. Korol’kov
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  8. K. E. Kuper
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  9. E. V. Petrova
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  10. V. F. Pindyurin
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Additional information

Original Russian Text © B.G. Gol’denberg, A.Yu. Abramskii, A.G. Zelinskii, A.I. Maslii, E.A. Maksimovskii, V.I. Kondrat’ev, V.P. Korol’kov, K.E. Kuper, E.V. Petrova, V.F. Pindyurin, 2011, published in Poverkhnost’. Rentgenovskie, Sinkhrotronnye i Neitronnye Issledovaniya, No. 2, pp. 61–68.

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Gol’denberg, B.G., Abramskii, A.Y., Zelinskii, A.G. et al. Features of the manufacture of deep X-ray lithography masks in the siberian synchrotron and terahertz radiation center. J. Surf. Investig. 5, 159–165 (2011). https://doi.org/10.1134/S1027451010111011

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  • DOI: https://doi.org/10.1134/S1027451010111011

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