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Application of a grid hollow cathode for substrate cleaning before vacuum deposition of coatings

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Abstract

The results of experimental applications of a gas discharge with a grid hollow cathode for substrate cleaning before coating deposition via the magnetron sputtering method and for their final polishing are presented. The dependences of the ion sputtering efficiency on the pressure and power of the discharge are investigated. It is revealed that sputtered material redeposition substantially contributes to the sputtering process. It is found that ion etching ensures smoothing of microroughnesses and microscratches and improves the optical properties of polished monocrystalline molybdenum substrates (mirrors).

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Authors and Affiliations

  1. Kurchatov Institute, Russian Research Center, Moscow, Russia

    A. V. Rogov

  2. MATI-Tsiolkovskii Russian State University of Technology, Moscow, Russia

    A. A. Lozovan

Authors
  1. A. V. Rogov
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  2. A. A. Lozovan
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Additional information

Original Russian Text © A.V. Rogov, A.A. Lozovan, 2008, published in Poverkhnost’. Rentgenovskie, Sinkhrotronnye i Neitronnye Issledovaniya, No. 5, pp. 99–103.

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Rogov, A.V., Lozovan, A.A. Application of a grid hollow cathode for substrate cleaning before vacuum deposition of coatings. J. Surf. Investig. 2, 409–413 (2008). https://doi.org/10.1134/S1027451008030154

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  • DOI: https://doi.org/10.1134/S1027451008030154

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