Abstract
Electrochemical copper oxidation in sulfuric acid aqueous solutions and sulfate electrolytes thickened with the silicon-dioxide powder is studied potentiodynamically. Based on the current theoretical concepts, the polarization-rate dependences of the anodic current density maximum is analyzed. It is shown that these dependences can be adequately described using a porous-layer resistance model that takes into account chemical decomposition of the passivating Cu2O film formed via electrochemical mechanism. The film decomposition rate constants are calculated for the studied electrolytic systems at different temperatures.
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Original Russian Text © A.V. Noskov, E.P. Grishina, A.M. Pimenova, 2006, published in Zashchita Metallov, 2006, Vol. 42, No. 2, pp. 163–167.
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Noskov, A.V., Grishina, E.P. & Pimenova, A.M. Kinetics of the Cu2O chemical decomposition during the copper electrochemical oxidation in the sulfuric-acid-based electrolyte systems. Prot Met 42, 149–152 (2006). https://doi.org/10.1134/S0033173206020081
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DOI: https://doi.org/10.1134/S0033173206020081