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Effect of О+ Ion Implantation on the Composition and Chemical Structure of Nanosized Surface Layers of a Copper–Nickel Alloy Cu50Ni50

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Abstract

This paper presents the results of our investigation into the effects of О+ and Ar+ ion implantation and alternating implantation of Ar+ and О+ ions on the composition of nanoscale surface layers of a 50Cu–50Ni alloy. Our study showed that at the selected parameters of О+ ion irradiation, the formation of nanoscale surface layers of the investigated alloy depends on the chemical affinity of oxygen atoms to the alloy components rather than on the processes of radiation nature accompanying the irradiation. This paper analyzes the possible segregation processes of the alloy components under conditions of О+ and Ar+ ion irradiation.

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ACKNOWLEDGMENTS

The work was performed within the framework of a task set by FASO (АААА-А16-116021010083-5) and was partially supported by the Russian Foundation for Basic Research (project no. 16-43-180765 r_а).

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Authors and Affiliations

  1. Physical Technical Institute, Ural Branch, Russian Academy of Sciences, 426000, Izhevsk, Russia

    V. L. Vorob’ev, F. Z. Gil’mutdinov, P. V. Bykov, V. Ya. Bayankin & A. A. Kolotov

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  1. V. L. Vorob’ev
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  2. F. Z. Gil’mutdinov
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  3. P. V. Bykov
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  4. V. Ya. Bayankin
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  5. A. A. Kolotov
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Correspondence to V. L. Vorob’ev.

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Translated by O. Golosova

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Vorob’ev, V.L., Gil’mutdinov, F.Z., Bykov, P.V. et al. Effect of О+ Ion Implantation on the Composition and Chemical Structure of Nanosized Surface Layers of a Copper–Nickel Alloy Cu50Ni50. Phys. Metals Metallogr. 119, 852–857 (2018). https://doi.org/10.1134/S0031918X18090144

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  • DOI: https://doi.org/10.1134/S0031918X18090144

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