Abstract
A method of simultaneous recording of double-exposure holograms with different lateral shears is proposed. This method makes it possible to reconstruct a series of interference patterns representing the phase shift caused by the object under study with different sensitivities. Aberration-free interference patterns in fringes of infinite and finite width with different visualization sensitivities for melting zones of a flat polyme-thylmethacrylate sample are presented.
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Original Russian Text © I.A. Lyavshuk, A.M. Lyalikov, 2006, published in Optika i Spektroskopiya, 2006, Vol. 101, No. 6, pp. 1023–1027.
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Lyavshuk, I.A., Lyalikov, A.M. Double-exposure variable shear holographic interferometry with controlled sensitivity. Opt. Spectrosc. 101, 962–966 (2006). https://doi.org/10.1134/S0030400X06120216
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DOI: https://doi.org/10.1134/S0030400X06120216