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Composition and structure of silicon carbonitride layers grown on Si(100)/(Fe, N, Co) substrates

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Abstract

The phase and chemical composition of silicon carbonitride films obtained by plasma-enhanced chemical vapor deposition on Si(100) substrates and the same substrates covered by a layer of (Fe, Ni, Co) alloy is studied. It is shown that substrate metallization practically does not change the chemical composition of the film, but affects the ratio phases present in the film and the film nanostructure.

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Authors and Affiliations

  1. A. V. Nikolaev Institute of Inorganic Chemistry, Siberian Division, Russian Academy of Sciences, Novosibirsk, Russia

    N. I. Fainer, V. I. Kosyakov, Yu. M. Rumyantsev, E. A. Maximovskii, S. A. Prokhorova & P. N. Gevko

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  1. N. I. Fainer
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  2. V. I. Kosyakov
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  3. Yu. M. Rumyantsev
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  4. E. A. Maximovskii
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  5. S. A. Prokhorova
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  6. P. N. Gevko
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Corresponding author

Correspondence to N. I. Fainer.

Additional information

Original Russian Text Copyright © 2012 by N. I. Fainer, V. I. Kosyakov, Yu. M. Rumyantsev, E. A. Maximovskii, S. A. Prokhorova, P. N. Gevko

Devoted to the Jubilee of Academician F. A. Kuznetsov

__________

Translated from Zhurnal Strukturnoi Khimii, Vol. 53, No. 4, pp. 821–827, July–August, 2012.

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Fainer, N.I., Kosyakov, V.I., Rumyantsev, Y.M. et al. Composition and structure of silicon carbonitride layers grown on Si(100)/(Fe, N, Co) substrates. J Struct Chem 53, 812–818 (2012). https://doi.org/10.1134/S0022476612040282

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  • DOI: https://doi.org/10.1134/S0022476612040282

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