Abstract—
We have studied chemical–mechanical and dynamic chemical polishing of the surface of single crystals of PbTe and Pb1 – xSnxTe solid solutions with bromine-releasing etchants based on aqueous (H2O2 + HBr + ethylene glycol)/glycerol solutions. The rates of chemical–mechanical and dynamic chemical polishing have been determined as functions of the dilution of the basic polishing etchant with an organic component. The composition of polishing mixtures and chemical etching conditions have been optimized using microstructural analysis of crystal surfaces, surface roughness measurements, and elemental analysis of sample surfaces.
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Malanych, G.P., Tomashyk, V.N. & Korchovyi, A.A. Chemical Polishing of Single-Crystal PbTe and Pb1 –xSnxTe Wafers. Inorg Mater 56, 785–790 (2020). https://doi.org/10.1134/S0020168520080099
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DOI: https://doi.org/10.1134/S0020168520080099