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The Influence of the Power Supply of a Magnetron Sputtering System on the Properties of the Deposited TiO2 Films

  • THE STUDY OF STRUCTURE AND PROPERTIES PHYSICAL METHODS FOR STUDY AND CONTROL
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Abstract

Advantages of fabricating precision optical coatings by magnetron sputtering with a gas discharge powered from a medium-frequency current-variation supply unit are considered. The significance of selecting optimal characteristics and operating modes of the power supply sources of the magnetron sputtering system (MSS) for fabrication of high-quality optical coatings is justified. Using the developed magnetron sputtering facility that comprises a multimode power supply unit of the MSS, samples with thin TiO2 films were fabricated at different recurrence frequencies fmag of the current pulses transmitted to the MSS and under other identical sputtering conditions. The samples were tested by laser ellipsometry, atomic force microscopy, X-ray diffractometry, and X-ray reflectometry. The influence of  fmag on the functional properties of the TiO2 films, namely, the refractive index, density, and roughness, is shown.

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ACKNOWLEDGMENTS

This work was supported by the Ministry of Science and Education of the Russian Federation, project “Optical Metamaterial-Based Transistors,” agreement no. 14.577.21.0219 dated September 29, 2016, on provision of grant, unique Applied Research and Experimental Development identifier RFMEF157716X0219. We are grateful to K.D. Shcherbachev, D.A. Kiselev, and R.N. Zhukov, employees of National University of Science and Technology MISiS, for their assistance with conducting experiments.

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Authors and Affiliations

  1. Research and Production Company Fotron-Auto, ul. Vvedenskogo 3, 117342, Moscow, Russia

    N. F. Abramov, A. V. Bezrukov & O. D. Vol’pyan

  2. Moscow Technological University (MIREA), pr. Vernadskogo 78, 119454, Moscow, Russia

    Yu. A. Obod

Authors
  1. N. F. Abramov
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  2. A. V. Bezrukov
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  3. O. D. Vol’pyan
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  4. Yu. A. Obod
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Correspondence to N. F. Abramov.

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Translated by O. Lotova

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Abramov, N.F., Bezrukov, A.V., Vol’pyan, O.D. et al. The Influence of the Power Supply of a Magnetron Sputtering System on the Properties of the Deposited TiO2 Films. Inorg Mater 54, 1491–1497 (2018). https://doi.org/10.1134/S0020168518150025

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  • DOI: https://doi.org/10.1134/S0020168518150025

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