Abstract—
We have carried out an integrated study of technological steps in the preparation of indium phosphide substrates for the epitaxial growth of heterostructures. We have investigated the surface morphology and condition of indium phosphide in (100)-oriented substrates and tested various chemical etchants for final chemical surface processing. Our results demonstrate that an optimal substrate preparation process is two-step chemical–mechanical polishing on both sides using zeolite slurries, with chemical polishing in a mixture of bromine and isopropanol as the final step.
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ACKNOWLEDGMENTS
This work was supported by the Russian Federation Ministry of Education and Science (state research target for the Kurnakov Institute of General and Inorganic Chemistry, Russian Academy of Sciences) and in part by the Presidium of the Russian Academy of Sciences (program no. I.35: Scientific Principles of Creating Novel Functional Materials).
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Vasil’ev, M.G., Vasil’ev, A.M., Izotov, A.D. et al. Preparation of Indium Phosphide Substrates for Epilayer Growth. Inorg Mater 54, 1109–1112 (2018). https://doi.org/10.1134/S0020168518110158
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DOI: https://doi.org/10.1134/S0020168518110158