Abstract
Tantalum coatings have been produced for the first time by hydrogen-free chemical vapor deposition through reduction of tantalum pentabromide with cadmium vapor, which allowed the deposition temperature to be substantially reduced (by more than 200 K). The coatings consisted of α- and/or β-Ta, depending on the substrate material.
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Original Russian Text © O.Yu. Goncharov, S.Yu. Treshchev, V.I. Lad’yanov, R.R. Faizullin, V.N. Guskov, L.Kh. Baldaev, 2017, published in Neorganicheskie Materialy, 2017, Vol. 53, No. 10, pp. 1087–1092.
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Goncharov, O.Y., Treshchev, S.Y., Lad’yanov, V.I. et al. Tantalum chemical vapor deposition on substrates from various materials. Inorg Mater 53, 1064–1068 (2017). https://doi.org/10.1134/S0020168517100089
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DOI: https://doi.org/10.1134/S0020168517100089