Abstract
A model is proposed for calculating the composition of GaAs x P1–x solid solutions, based on the iterative determination of the equilibrium partial pressures of the pyrolysis products of the starting reagents, followed by calculation of the composition of the solid solution in an adsorption–desorption model. The proposed model ensures good agreement between calculation results and experimental data.
Similar content being viewed by others
References
Vasil’ev, M.G., Vasil’ev, A.M., Izotov, A.D., and Shelyakin, A.A., Laser diode for remote sensing of methane, Inorg. Mater., 2012, vol. 48, no. 3, pp. 252–257.
Samuelson, L., Omling, P., and Grimmeiss, H.G., Alloying mechanisms in MOVPE GaAs1–xPx, J. Cryst. Growth, 1983, vol. 61, pp. 425–426.
Leys, M.R., Titze, H., Samuelson, L., and Petruzzello, J., Growth and characterization of strained layers of GaAs1–xPx, J. Cryst. Growth, 1988, vol. 93, p.504.
Koukitu, A. and Seki, H., Thermodynamic analysis of the MOVPE growth of quaternary III–V alloy semiconductors, J. Cryst. Growth, 1986, vol. 76, pp. 233–242.
Seki, H. and Koukitu, A., Thermodynamic analysis of metalorganic vapor phase epitaxy of III–V alloy semiconductors, J. Cryst. Growth, 1986, vol. 74, pp. 172–180.
Ban, V.S., Gossenberger, J.F., and Tietjen, J.J., Influence of deposition temperature on composition and growth rate of GaAs1–xPx layers, J. Appl. Phys., 1972, vol. 43, pp. 2471–2477.
Jordan, A.S. and Robertson, A., Copyrolysis of AsH3 and PH3 in the epitaxial growth of ternary and quaternary III–V alloys, J. Cryst. Growth, 1994, vol. 137, pp. 224–230.
Pellegrino, S. and Vitali, L., Deposition of InGaAsP alloys on GaAs by low pressure metalorganic vapor phase epitaxy: theory and experiments, J. Electron. Mater., 1996, vol. 25, no. 3, pp. 519–525.
Chen, C.H., Kao, D.S., and Stringfellow, G.B., Use of tertiarybutylphosphine for the growth of InP and GaAs1–xPx, J. Electron. Mater., 1988, vol. 17, pp. 67–73.
Jou, M.J. and Stringfellow, G.B., Organometallic vapor phase epitaxial growth studies of GaP1–xSbx and InP1–xSbx, J. Cryst. Growth, 1989, vol. 98, pp. 679–689.
Asai, T. and Dandy, D.S., Thermodynamic analysis of III–V semiconductor alloys grown by metalorganic vapor phase epitaxy, J. Appl. Phys., 2000, vol. 88, no. 7, pp. 4407–4416.
Korn, G.A. and Korn, T.M., Mathematical Handbook for Scientists and Engineers, New York: McGraw-Hill, 1968, 2nd ed., p. 1130.
Ihsan Barin, Thermochemical Data of Pure Substances, Weinheim: VCH Verlagsgesellschaft, 1995, 3rd ed., p. 1885.
Chase, M.W., et al., JANAF Thermochemical Tables, Midland: Dow Chemical, 1985, 3rd ed.
Chase, M.W., Jr., NIST–JANAF thermochemical tables, fourth edition, J. Phys. Chem. Ref. Data, 1998.
Lodders, K., Revised thermochemical properties phosphinidene (PH), phosphine (PH3), phosphorus nitride (PN), and magnesium phosphate (Mg3P2O8), J. Phys. Chem. Ref. Data, 1999, vol. 28, no. 6, pp. 1705–1712.
Leitner, J. and Mikulec, J., Thermodynamic analysis of the deposition of GaAs epitaxial layers prepared by the MOCVD method, J. Cryst. Growth, 1991, vol. 112, pp. 437–444.
Landolt–Bornstein, Numerical Data and Functional Relationships in Science and Technology, Berlin: Springer, 1982, p.620.
Samuelson, L., Omling, R., Titze, H., and Grimmeiss, H.R., Electrical and optical properties of deep levels in MPVPE grown GaAs, J. Cryst. Growth, 1981, vol. 55, pp. 164–172.
Larsen, C.A. and Stringfellow, G.B., Decomposition kinetics of OMVPE precursors, J. Cryst. Growth, 1986, vol. 75, pp. 247–254.
Author information
Authors and Affiliations
Corresponding author
Additional information
Original Russian Text © A.D. Maksimov, V.Yu. Eistrikh-Geller, A.A. Marmalyuk, M.A. Ladugin, T.A. Bagaev, P.V. Gorlachuk, I.V. Yarotskaya, 2017, published in Neorganicheskie Materialy, 2017, Vol. 53, No. 4, pp. 362–368.
Rights and permissions
About this article
Cite this article
Maksimov, A.D., Eistrikh-Geller, V.Y., Marmalyuk, A.A. et al. A model for calculating the composition of GaAs x P1–x solid solutions under metalorganic vapor phase epitaxy conditions. Inorg Mater 53, 369–375 (2017). https://doi.org/10.1134/S0020168517040124
Received:
Revised:
Published:
Issue Date:
DOI: https://doi.org/10.1134/S0020168517040124