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Transport properties of silicon doped with manganese via low-temperature diffusion

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Abstract

We have studied the transport properties of silicon doped with manganese via low-temperature diffusion. The material exhibits colossal photoconductivity in the extrinsic region (1.5–3 μm), an abnormally high negative magnetoresistance, and a temperature variation of hole mobility atypical of silicon. The state of the manganese atoms has been probed by electron paramagnetic resonance spectroscopy and atomic force microscopy. The results are used to infer the structure of nanoclusters consisting of manganese atoms and to develop an approach to controlling the charge state and magnetic moment of the nanoclusters.

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Correspondence to G. Kh. Mavlonov.

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Original Russian Text © M.K. Bakhadyrkhanov, G.Kh. Mavlonov, S.B. Isamov, Kh.M. Iliev, K.S. Ayupov, Z.M. Saparniyazova, S.A. Tachilin, 2011, published in Neorganicheskie Materialy, 2011, Vol. 47, No. 5, pp. 545–550.

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Bakhadyrkhanov, M.K., Mavlonov, G.K., Isamov, S.B. et al. Transport properties of silicon doped with manganese via low-temperature diffusion. Inorg Mater 47, 479–483 (2011). https://doi.org/10.1134/S0020168511050062

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  • DOI: https://doi.org/10.1134/S0020168511050062

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