Abstract
Hall effect measurements demonstrate that quenching of Ge1 − x Si x 〈Cu,In,Sb〉 (0 ≤ x ≤ 0.20) multiply doped crystals from 1050–1080 K leads to the formation of additional deep donor centers. The energy level of the centers is located in the bottom half of the band gap of the Ge1 − x Si x crystals and is a linear function of host composition. Annealing the crystals at 550–570 K completely eliminates the additional donor levels. The most likely model of the additional deep donors is a pair of substitutional copper and indium atoms (CusIns) or a complex of a copper interstitial and a substitutional indium atom (CuiIns).
Similar content being viewed by others
References
Milnes, A.G., Deep Impurities in Semiconductors, New York: Wiley, 1973.
Azhdarov, G.Kh., Kyazimzade, R.Z., and Hostut, M., Deep Impurity Levels in Ge-Si Alloys, Solid State Commun., 1999, vol. 111, pp. 675–679.
Shklovskii, B.N. and Efros, A.L., Elektronnye svoistva legirovannykh poluprovodnikov (Electronic Properties of Doped Semiconductors), Moscow: Nauka, 1979.
Zakhrabekova, Z.M., Zeinalov, Z.M., Kyazimova, V.K., and Azhdarov, G.Kh., Segregation of Aluminum and Indium Impurities in Ge1 − x Six Crystals, Neorg. Mater., 2007, vol. 43, no. 1, pp. 5–9 [Inorg. Mater. (Engl. Transl.), vol. 43, no. 1, pp. 3–7].
Azhdarov, G.Kh., Kucukomeroglu, T., Varilci, A., et al., Distribution of Components in Ge-Si Bulk Single Crystals Grown under the Continuous Feeding of the Melt with the Second Component (Si), J. Cryst. Growth, 2001, vol. 226, no. 4, pp. 437–442.
Yonenaga, I., Czochralski Growth of Heavily Impurity Doped Crystals of GeSi Alloys, J. Cryst. Growth, 2001, vol. 226, no. 1, pp. 47–51.
Abrosimov, N.V., Rossolenko, S.N., Thieme, W., et al., Czochralski Growth of Si- and Ge-Rich SiGe Single Crystals, J. Cryst. Growth, 1997, vol. 174, nos. 1–4, pp. 182–186.
Marin, C. and Ostrogorsky, A.G., Growth of Ga-Doped Ge0.98Si0.02 by Vertical Bridgman with a Baffle, J. Cryst. Growth, 2000, vol. 211, pp. 378–383.
Barz, A., Dold, P., Kerat, U., et al., Germanium-Rich SiGe Bulk Single Crystals Grown by the Vertical Bridgman Method and by Zone Melting, J. Vac. Sci. Technol., B., 1998, vol. 16, no. 3, pp. 1627–1630.
Nakajima, K., Kodama, S., Miyashita, S., et al., Growth of Ge-Rich Ge1 − x Single Crystal with Uniform Composition (x = 0.02) on a Compositionally Graded Crystal for Use As GaAs Solar Cells, J. Cryst. Growth, 1999, vol. 205, no. 3, pp. 270–276.
Azhdarov, G.Kh., Zeynalov, Z.M., and Huseynli, L.A., The Distribution of Ga and Sb Impurities in Ge-Si Crystals Grown by the Bridgman Method Using a Feeding Rod, Kristallografiya, 2009, vol. 54, no. 1, pp. 137–141 [Crystallogr. Rep. (Engl. Transl.), vol. 54, no. 1, pp. 152–156].
Kyazimova, V.K., Zeynalov, Z.M., Zakhrabekova, Z.M., and Azhdarov, G.Kh., Distribution of Aluminum and Indium Impurities in Crystals of Ge-Si Solid Solutions Grown from the Melt, Crystallogr. Rep., 2006, vol. 51,suppl. 1, pp. S192–S195.
Fistul’, V.I. and Yakovenko, A.G., Decomposition of Supersaturated Solid Solutions As a Method for Precision Doping of Semiconductors, in Legirovanie poluprovodnikov (Doping of Semiconductors), Moscow: Metallurgiya, 1982.
Azhdarov, P.G., Copper-Related Deep Acceptor in Heat-Treated Ge1 − x Six Single Crystals, Neorg. Mater., 2000, vol. 36, no. 5, pp. 526–528 [Inorg. Mater. (Engl. Transl.), vol. 36, no. 5, pp. 426–428].
Belokurova, I.N., Degtyarev, V.D., and Skudnova, E.D., Effect of Silicon on the Decomposition of Supersaturated Solid Solutions of Copper in Germanium, Izv. Akad. Nauk SSSR, Neorg. Mater., 1986, vol. 22, no. 1, pp. 145–147.
Azhdarov, G.Kh., Kyazimzade, R.Z., and Mir-Bagirov, V.V., Acceptor Levels of Substitutional Copper in Ge1 − x Six Crystals, Fiz. Tekh. Poluprovodn. (S.-Peterburg), 1992, vol. 26, no. 2, pp. 553–556.
Kamiura, Y., Hoshimoto, F., Nobusada, T., and Yoneyama, S., Copper-Related Deep Acceptor in Quenched Germanium, J. Appl. Phys., 1984, vol. 56, no. 4, pp. 936–941.
Skudnova, E.V., Degtyarev, V.F., and Prokof’eva, V.K., Heat Treatment of Germanium Doped with Copper and Oxygen, Izv. Akad. Nauk SSSR, Neorg. Mater., 1988, vol. 24, no. 2, pp. 198–201.
Gvelesiani, A.A., Degtyarev, V.F., and Skudnova, E.V., Effect of Heat Treatment on the Properties of Copper-Doped Germanium, Izv. Akad. Nauk SSSR, Neorg. Mater., 1987, vol. 23, no. 3, pp. 368–372.
Blakemore, J.S., Semiconductor Statistics, Oxford: Pergamon, 1962.
Hall, R.N. and Racette, J.H., Diffusion and Solubility of Copper in Extrinsic and Intrinsic Germanium, Silicon and Gallium Arsenide, J. Appl. Phys., 1964, vol. 33, no. 2, pp. 379–397.
Kamiura, Y. and Hashimoto, F., Copper-Related Deep Acceptor in Quenched Germanium, Jpn. J. Appl. Phys., 1989, vol. 28, no. 5, pp. 753–769.
Author information
Authors and Affiliations
Corresponding author
Additional information
Original Russian Text © G.Kh. Azhdarov, Z.M. Zeynalov, V.K. Kyazimova, L.A. Huseynli, 2010, published in Neorganicheskie Materialy, 2010, Vol. 46, No. 12, pp. 1418–1422.
Rights and permissions
About this article
Cite this article
Azhdarov, G.K., Zeynalov, Z.M., Kyazimova, V.K. et al. Deep donor center in Ge1 − x Si x 〈Cu,In,Sb〉 crystals at 1050–1080 K. Inorg Mater 46, 1285–1289 (2010). https://doi.org/10.1134/S0020168510120022
Received:
Published:
Issue Date:
DOI: https://doi.org/10.1134/S0020168510120022