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Effect of the Cd0.96Zn0.04Te substrate polishing procedure on Cd x Hg1 − x Te liquid phase epitaxy

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Abstract

This paper examines the effect of polishing procedure on the surface quality of Cd0.96Zn0.04Te substrates for Cd x Hg1 − x Te liquid phase epitaxy. Two polishing procedures are tested: stepwise polishing involving abrasive, chemomechanical, and chemical steps with the use of various abrasives, and abrasive-free polishing. The optimal procedure is chemomechanical polishing with no abrasives. The type of substrate surface can be identified using the Nakagawa etchant, which produces etch patterns in the form of triangles on the A(111) surface and circles on the B(111) surface.

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Authors and Affiliations

  1. Abdullaev Institute of Physics, Academy of Sciences of Azerbaijan, pr. Javida 33, Baku, AZ1143, Azerbaijan

    Sh. O. Eminov, A. A. Rajabli & T. I. Ibragimov

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  1. Sh. O. Eminov
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  2. A. A. Rajabli
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  3. T. I. Ibragimov
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Correspondence to Sh. O. Eminov.

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Original Russian Text © Sh.O. Eminov, A.A. Rajabli, T.I. Ibragimov, 2010, published in Neorganicheskie Materialy, 2010, Vol. 46, No. 7, pp. 796–800.

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Eminov, S.O., Rajabli, A.A. & Ibragimov, T.I. Effect of the Cd0.96Zn0.04Te substrate polishing procedure on Cd x Hg1 − x Te liquid phase epitaxy. Inorg Mater 46, 714–717 (2010). https://doi.org/10.1134/S0020168510070058

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  • DOI: https://doi.org/10.1134/S0020168510070058

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