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Vapor phase growth of nanostructured yttrium oxysulfide films

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Abstract

Nanostructured yttrium oxysulfide films have been prepared via vapor phase growth. The first step was the deposition of 50-nm-thick nanostructured yttria films from yttrium dipivaloylmethanate vapor at 525°C. Next, the films were sulfided in ammonium thiocyanate vapor at temperatures from 800 to 1100°C. Hexagonal yttrium oxysulfide was obtained at 900°C and higher temperatures. The films consisted of densely packed grains about 50 nm in size.

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Authors and Affiliations

  1. Nikolaev Institute of Inorganic Chemistry, Siberian Division, Russian Academy of Sciences, pr. Akademika Lavrent’eva 3, Novosibirsk, 630090, Russia

    V. V. Bakovets, T. M. Levashova, I. Yu. Filatova, E. A. Maksimovskii & A. E. Kupcha

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  1. V. V. Bakovets
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  2. T. M. Levashova
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  3. I. Yu. Filatova
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  4. E. A. Maksimovskii
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  5. A. E. Kupcha
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Correspondence to V. V. Bakovets.

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Original Russian Text © V.V. Bakovets, T.M. Levashova, I.Yu. Filatova, E.A. Maksimovskii, A.E. Kupcha, 2008, published in Neorganicheskie Materialy, 2008, Vol. 44, No. 1, pp. 73–75.

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Bakovets, V.V., Levashova, T.M., Filatova, I.Y. et al. Vapor phase growth of nanostructured yttrium oxysulfide films. Inorg Mater 44, 67–69 (2008). https://doi.org/10.1134/S0020168508010111

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  • DOI: https://doi.org/10.1134/S0020168508010111

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