Skip to main content
SpringerLink
Log in

Growth and Characterization of Fluorocarbon Thin Films from Low Pressure Tetrafluoromethane, Hexafluoroethane and Octafluorocyclobutane Plasmas

  • SUBMITTED TO HIGH ENERGY CHEMISTRY
  • Published:
High Energy Chemistry Aims and scope Submit manuscript

Abstract

This study aims to explore the plasma polymerization reaction of fluorocarbon gases, with specific focus on three monomers: tetrafluoromethane, hexafluoroethane, and octafluorocyclobutane. Optical emission spectroscopy was employed to observe species within the glow discharge, while detecting plasma species in fluorocarbon plasma polymerization. Fluorocarbon plasma polymerized films surface morphology and roughness were scrutinized using scanning electron microscopy and atomic force microscopy. Chemical bonding on film surfaces was probed using X-ray photoelectron spectroscopy. Experimental outcomes highlight the essential role of chemical interactions between fluorocarbon plasma and monomers, with film surface composition inferred from fluorocarbon ratio analysis. These analyses improve the understanding of fluorocarbon-to-carbon ratio and duty cycle contributions to plasma polymerized film growth, which promises advancements in the ability to tailor fluorocarbon films to specific applications.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Log in via an institution

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Institutional subscriptions

Fig. 1.
Fig. 2.
Fig. 3.
Fig. 4.
Fig. 5.
Fig. 6.

REFERENCES

  1. Amirov, I.I. and Alov, N.V., High Energy Chem., 2006, vol. 40, p. 267.

    Article  CAS  Google Scholar 

  2. Sharma, U., et al., J. Phys. Conf. Ser., 2016, vol. 755, no. 1, p. 012010.

    Article  Google Scholar 

  3. Akishev, Y.S., Grushin, M.E., Monich, A.E., Napartovich, A.P., and Trushkin, N.I., High Energy Chem., 2003, vol. 37, p. 286.

    Article  CAS  Google Scholar 

  4. Chen, F.F., Plasma Sources Sci. Technol., 2009, vol. 18, no. 3, p. 035012.

    Article  Google Scholar 

  5. Vizireanu, S., Stoica, S.D., Luculescu, C., Nistor, L.C., Mitu, B., and Dinescu, G., Plasma Sources Sci. Technol., 2010, vol. 19, no. 3, p. 034016.

    Article  Google Scholar 

  6. Sigurdsson, S., and Shishoo, R., J. Appl. Polym. Sci., 1997, vol. 66, no. 8, p. 1591.

    Article  CAS  Google Scholar 

  7. Saito, H., and Watanabe, T., Thin Solid Films, 2009, vol. 518, no. 3, p. 929.

    Article  Google Scholar 

  8. Matsubara, K., Danno, M., Inoue, M., Nishizawa, H., Honda, Y., and Abe, T., Appl. Surf. Sci., 2013, vol. 284, p. 340.

    Article  CAS  Google Scholar 

  9. Masuoka, T. and Yasuda, H., J. Polym. Sci., Part. A: Polym. Chem., 1982, vol. 20, no. 9, p. 2633.

    CAS  Google Scholar 

  10. Parveen, S., Rana, S., and Goswami, P., Materials, 2021, vol. 14, no. 12, p. 3228.

    Article  CAS  PubMed  PubMed Central  Google Scholar 

  11. Peters, A. M. and Nastasi, M., J. Vac. Sci. Technol., A, 2001, vol. 19, no. 6, p. 2773.

    Article  CAS  Google Scholar 

  12. Visser, S.A., Hewitt, C.E., Fornalik, J., Braunstein, G., Srividya, C., and Babu, S.V., J. Appl. Polym. Sci., 1997, vol. 66, no. 3, p. 409.

    Article  CAS  Google Scholar 

  13. Tajima, S. and Komvopoulos, K., J. Phys. Chem. C, 2007, vol. 111, no. 11, p. 4358.

    Article  CAS  Google Scholar 

  14. Baloniak, T. and von Keudell, A., Plasma Process. Polym., 2008, vol. 5, no. 7, p. 653.

    Article  CAS  Google Scholar 

  15. Yeo, L.P., Yan, Y.H., Lam, Y.C., and Chan-Park, M.B., Langmuir, 2006, vol. 22, no. 24, p. 10196.

    Article  CAS  PubMed  Google Scholar 

  16. Muzammil, I., Li, Y.P., Li, X.Y., and Lei, M.K., Appl. Surf. Sci., 2018, vol. 436, p. 411.

    Article  CAS  Google Scholar 

  17. Peri, S.R., Habersberger, B., Akgun, B., Jiang, H., Enlow, J., Bunning, T.J., and Foster, M.D., Polymer, 2010, vol. 51, no. 19, p. 4390.

    Article  CAS  Google Scholar 

  18. Boinovich, L.B. and Emelyanenko, A.M., Russ. Chem. Rev., 2008, vol. 77, no. 7, p. 583.

    Article  CAS  Google Scholar 

  19. Timmons, R.B. and Griggs, A.J., Plasma Polymer Films, Biederman, H., Ed., London: Imperial College Press, 2004, p. 217.

    Google Scholar 

  20. Economou, D.J., J. Phys. D: Appl. Phys., 2014, vol. 47, no. 30, p. 303001.

    Article  Google Scholar 

  21. Reedy, T.M., Kale, N.V., Dutton, J.C., and Elliott, G.S., AIAA J., 2013, vol. 51, no. 8, p. 2027.

    Article  Google Scholar 

  22. Huang, C., Lin, C.I., Tsai, C.Y., and Pan, C.H., IEEE Trans. Plasma Sci., 2011, vol. 39, no. 11, p. 2506.

    Article  CAS  Google Scholar 

  23. Yasuda, H., Luminous Chemical Vapor Deposition and Interface Engineering, New York: Marcel Dekker, 2005.

    Google Scholar 

  24. Huang, Y.C., Yu, Q., and Huang, C., High Energy Chem., 2022, vol. 56, no. 2 p. 122.

    Article  CAS  Google Scholar 

  25. Yasuda, H., Plasma Polymerization, Orlando: Academic, 1985.

    Google Scholar 

  26. Luginbuhl, R., Garrison, M.D., Overney, R.M.; Weiss, L., Schieferdecker, H., Hild, S., and Ratner, B.D., Fluorinated Surfaces, Coatings, and Films, Washington, D.C.: American Chemical Society, 2001.

    Google Scholar 

Download references

Funding

The authors are thankful for the support of the National Science and Technology Council through grants of NSTC-111-2221-E 155-002-MY2.

Author information

Authors and Affiliations

  1. Department of Chemical Engineering and Materials Science, Yuan Ze University, 32003, Chung-Li, Taiwan

    Jia-Cih Jhuang, Yu-Liang Hung & Chun Huang

Authors
  1. Jia-Cih Jhuang
    View author publications

    You can also search for this author in PubMed Google Scholar

  2. Yu-Liang Hung
    View author publications

    You can also search for this author in PubMed Google Scholar

  3. Chun Huang
    View author publications

    You can also search for this author in PubMed Google Scholar

Corresponding author

Correspondence to Chun Huang.

Ethics declarations

The authors of this work declare that they have no conflicts of interest.

Additional information

Publisher’s Note.

Pleiades Publishing remains neutral with regard to jurisdictional claims in published maps and institutional affiliations.

Rights and permissions

Reprints and permissions

About this article

Check for updates. Verify currency and authenticity via CrossMark

Cite this article

Jia-Cih Jhuang, Hung, YL. & Huang, C. Growth and Characterization of Fluorocarbon Thin Films from Low Pressure Tetrafluoromethane, Hexafluoroethane and Octafluorocyclobutane Plasmas. High Energy Chem 58, 158–165 (2024). https://doi.org/10.1134/S0018143924010089

Download citation

  • Received:

  • Revised:

  • Accepted:

  • Published:

  • Issue Date:

  • DOI: https://doi.org/10.1134/S0018143924010089

Keywords:

Search

Navigation