Abstract
Experimental data presented in the literature on the depth of processing of polymer films using low-temperature plasma are considered. Changes in the chemical composition and structure along the depth of the samples have been studied using the modern experimental techniques of X-ray photoelectron spectroscopy, secondary ion mass spectrometry, and transmission electron microscopy; precision etching was carried out with an Ar+2500 cluster beam; and the pit depth was measured by profilometry. It has been found that the thickness of the modified layer is ≤50 nm and depends relatively little on the polymer nature.
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The work was supported by the Ministry of Science and Education of the Russian Federation, project no. FFSM-2021-0006.
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Translated by S. Zatonsky
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Gilman, A.B., Piskarev, M.S. & Kuznetsov, A.A. Thickness of the Modified Polymer Layer Formed by Low-Temperature Plasma Treatment. High Energy Chem 57, 440–443 (2023). https://doi.org/10.1134/S001814392305003X
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DOI: https://doi.org/10.1134/S001814392305003X