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Photocatalytic lithography based on thin films of amorphous hydrated titanium dioxide


The mechanism of photoactivation of amorphous hydrated titanium dioxide thin films containing palladium ions toward the reaction of electroless deposition of nickel was studied. It was shown that the photocatalytic reduction of palladium ions during UV irradiation results in the formation of intermediate Pd(I) states that subsequently disproportionate, yielding a Pd nanophase. The palladium nanoparticle-catalyzed electroless deposition of nickel on exposed areas of the titanium dioxide photolayer makes it possible to fabricate metal patterns having a 5-μm resolution, with the fast and irreversible capture of photoelectrons at the latent image formation step preventing the image from blurring, including the process on conducting substrates.

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Correspondence to D. V. Sviridov.

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Original Russian Text © E.V. Skorb, V.G. Sokolov, T.V. Byk, T.V. Gaevskaya, D.V. Sviridov, Chan-Ho Noh, 2008, published in Khimiya Vysokikh Energii, 2008, Vol. 42, No. 2, pp. 158–163.

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Skorb, E.V., Sokolov, V.G., Byk, T.V. et al. Photocatalytic lithography based on thin films of amorphous hydrated titanium dioxide. High Energy Chem 42, 127–131 (2008).

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  • Palladium
  • Oxalic Acid
  • Glycolic Acid
  • High Energy Chemistry
  • Latent Image