Abstract
A photoinduced change in the magnetic resonance parameters is observed in trilayer films of the system Fe/Si/Fe. The shifts of the resonance field and the character of the interlayer interaction are investigated as functions of the temperature, illumination of the films, and thickness of the silicon interlayer. It is found that at low temperatures the photoinduced contribution to the exchange interaction constant between the iron layers is antiferromagnetic.
Similar content being viewed by others
References
P. Grunberg, R. Schreiber, Y. Pang et al., Phys. Rev. Lett. 57, 2442 (1986).
E. G. Eliseeva, V. P. Kononov, V. M. Popel et al., Prib. Tekh. Éksp., No. 2, 141 (1997).
N. V. Volkov and G. S. Patrin, Preprint No. 635F [in Russian], Institute of Physics, Siberian Branch of the Russian Academy of Sciences, Krasnoyarsk, 1990.
J. E. Mattson, E. E. Fullerton, S. Kumar et al., J. Appl. Phys. 75, 6169 (1994).
A. Laude, J. Magn. Magn. Mater. 92, 143 (1990).
E. P. Elsukov, Author’s Abstract of Doctoral Dissertation [in Russian], Moscow State University, Moscow, 1994.
D. M. Edwards, J. Mothon, R. B. Muniz, and M. S. Pan, J. Phys.: Condens. Matter 3, 4941 (1991).
J. Mothon, M. Willert, D. M. Edwards, and R. B. Muniz, Fiz. Met. Metalloved. 79, 9 (1995).
N. F. Mott and E. A. Davis, Electronic Processes in Non-Crystalline Materials, Clarendon Press, Oxford, 1971 [Russian translation, Mir, Moscow, 1974].
Author information
Authors and Affiliations
Additional information
Pis’ma Zh. Éksp. Teor. Fiz. 68, No. 4, 287–290 (25 August 1998)