Abstract
Interaction of iron atoms with the Si(100)-2 × 1 surface at room temperature is studied by core-level photoelectron spectroscopy using synchrotron radiation for Fe coverages ranging from a fraction of a monolayer to six monolayers. It is shown that the Fe/Si(100)-2 × 1 interface is chemically active: the Fe-Si solid solution forms early in deposition of iron on silicon. When the Fe coverage reaches four to five monolayers, the state of the system is changed and Fe3Si silicide arises.
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Translated from Zhurnal Tekhnichesko\(\overset{\lower0.5em\hbox{$\smash{\scriptscriptstyle\smile}$}}{l} \) Fiziki, Vol. 75, No. 9, 2005, pp. 106–110.
Original Russian Text Copyright © 2005 by Gomoyunova, Pronin, Malygin, Solov’ev, Vyalykh, Molodtsov.
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Gomoyunova, M.V., Pronin, I.I., Malygin, D.E. et al. Interaction of iron atoms with the Si(100)-2 × 1 surface. Tech. Phys. 50, 1212–1216 (2005). https://doi.org/10.1134/1.2051465
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DOI: https://doi.org/10.1134/1.2051465