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Effect of the nanographite film thickness on the optical rectification pulse

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Abstract

The phenomenon of optical rectification during pulsed laser irradiation was studied in nanographite films of various thicknesses obtained by plasmachemical deposition on silicon substrates. The amplitude of the optical rectification pulse (ORP) strongly depends on the film thickness h and reaches a maximum at h ∼ 2.5 μm. At a smaller film thickness, the ORP is accompanied by a photoelectric signal of microsecond duration, which arises in the silicon substrate. For the nanographite films with h > 2.5 μm, the ORP is observed in the absence of any signal from the substrate, which allows such films to be used in fast-response detectors of pulsed laser radiation in a broad spectral range.

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Authors and Affiliations

  1. Institute of Applied Mechanics, Ural Division, Russian Academy of Sciences, Izhevsk, Udmurtia, 426067, Russia

    G. M. Mikheev & R. G. Zonov

  2. Department of Physics, Moscow State University, Moscow, 119992, Russia

    A. N. Obraztsov & A. P. Volkov

  3. Department of Physics, Joensuu University, Joensuu, Finland

    Yu. P. Svirko

Authors
  1. G. M. Mikheev
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  2. R. G. Zonov
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  3. A. N. Obraztsov
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  4. A. P. Volkov
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  5. Yu. P. Svirko
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Translated from Pis’ma v Zhurnal Tekhnichesko\(\overset{\lower0.5em\hbox{$\smash{\scriptscriptstyle\smile}$}}{l}\) Fiziki, Vol. 31, No. 13, 2005, pp. 50–57.

Original Russian Text Copyright © 2005 by Mikheev, Zonov, Obraztsov, Volkov, Svirko.

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Mikheev, G.M., Zonov, R.G., Obraztsov, A.N. et al. Effect of the nanographite film thickness on the optical rectification pulse. Tech. Phys. Lett. 31, 560–563 (2005). https://doi.org/10.1134/1.2001054

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  • DOI: https://doi.org/10.1134/1.2001054

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