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Nitriding of technical-purity titanium in hollow-cathode glow discharge

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Abstract

The process of nitriding at low pressures and temperatures (≤550°C) in hollow-cathode glow discharge plasma was studied for technical-purity titanium of the VT1-0 commercial grade. The diffusion saturation of titanium with nitrogen in plasma with a concentration of n = 1010–1011 cm−3 takes place at an ion current density on the cathode within 1.6–4.0 mA/cm2. It is established that a key role in the process of metal saturation is played by atomic nitrogen. The experiments revealed the formation of a layer of gradient structure with a high microhardness (∼14 GPa) on the surface of nitrided titanium.

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References

  1. K. T. Rei and T. Lampe, Mater. Sci. Eng. 69, 437 (1985).

    Google Scholar 

  2. T. A. Panaioti, Fiz. Khim. Obrab. Mater., No. 4, 70 (2003).

  3. A. M. Smyslov and E. V. Safin, in Proceedings of the 5th Conference on Modification of Material with Particle Beams and Plasma Flows, Tomsk, 2000, pp. 352–353.

  4. V. V. Budilov and R. D. Agzamov, in Proceedings of 6th Conference on Modification of Material with Particle Beams and Plasma Flows, Tomsk, 2002, pp. 428–431.

  5. V. M. Nerovnyi and V. V. Peremit’ko, Fiz. Khim. Obrab. Mater., No. 3, 49 (1995).

  6. M. I. Guseva, G. M. Gordeeva, Yu. V. Martynenko, et al., Fiz. Khim. Obrab. Mater., No. 2, 11 (1999).

  7. E. I. Meletis, Surf. Coat. Technol. 149, 95 (2002).

    Article  Google Scholar 

  8. P. M. Schanin, N. N. Koval, Yu. A. Akhmadeev, and S. V. Grigor’ev, Zh. Tekh. Fiz. 74(5), 24 (2004) [Tech. Phys. 49, 545 (2004)].

    Google Scholar 

  9. Z. X. Cao and H. Oecher, J. Vac. Sci. Technol. A 22, 321 (2004).

    Article  ADS  Google Scholar 

Download references

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Authors and Affiliations

  1. Institute of High-Current Electronics, Siberian Division, Russian Academy of Sciences, Tomsk, 634055, Russia

    Yu. Kh. Akhmadeev, I. M. Goncharenko, Yu. F. Ivanov, N. N. Koval & P. M. Schanin

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  1. Yu. Kh. Akhmadeev
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  2. I. M. Goncharenko
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  3. Yu. F. Ivanov
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  4. N. N. Koval
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  5. P. M. Schanin
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Translated from Pis’ma v Zhurnal Tekhnichesko\(\overset{\lower0.5em\hbox{$\smash{\scriptscriptstyle\smile}$}}{l}\) Fiziki, Vol. 31, No. 13, 2005, pp. 24–30.

Original Russian Text Copyright © 2005 by Akhmadeev, Goncharenko, Ivanov, Koval, Schanin.

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Akhmadeev, Y.K., Goncharenko, I.M., Ivanov, Y.F. et al. Nitriding of technical-purity titanium in hollow-cathode glow discharge. Tech. Phys. Lett. 31, 548–550 (2005). https://doi.org/10.1134/1.2001050

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  • DOI: https://doi.org/10.1134/1.2001050

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