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The effect of γ radiation on the temperature dependence of the surface generation velocity at a Si-SiO2 interface

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Abstract

We have studied the effect of γ radiation on the generation characteristics of a silicon-silicon dioxide (Si-SiO2) interface formed upon thermal oxidation of the surface of silicon. The irradiation leads to the appearance of a temperature dependence of the surface generation velocity. This effect is related to the formation of radiation-induced traps capable of exchanging trapped carriers with the bulk of a semiconductor by means of tunneling emission.

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Translated from Pis’ma v Zhurnal Tekhnichesko\(\overset{\lower0.5em\hbox{$\smash{\scriptscriptstyle\smile}$}}{l}\) Fiziki, Vol. 31, No. 7, 2005, pp. 40–44.

Original Russian Text Copyright © 2005 by Parchinski\(\overset{\lower0.5em\hbox{$\smash{\scriptscriptstyle\smile}$}}{l}\), Liga\(\overset{\lower0.5em\hbox{$\smash{\scriptscriptstyle\smile}$}}{l}\), Mansurov, Iulchiev.

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Parchinskii, P.B., Ligai, L.G., Mansurov, K.Z. et al. The effect of γ radiation on the temperature dependence of the surface generation velocity at a Si-SiO2 interface. Tech. Phys. Lett. 31, 288–289 (2005). https://doi.org/10.1134/1.1920373

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  • DOI: https://doi.org/10.1134/1.1920373

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