Abstract
We have studied the effect of γ radiation on the generation characteristics of a silicon-silicon dioxide (Si-SiO2) interface formed upon thermal oxidation of the surface of silicon. The irradiation leads to the appearance of a temperature dependence of the surface generation velocity. This effect is related to the formation of radiation-induced traps capable of exchanging trapped carriers with the bulk of a semiconductor by means of tunneling emission.
Similar content being viewed by others
References
V. G. Litovchenko and A. P. Gorban’, Principles of the Physics of Metal-Insulator-Semiconductor Structures for Microelectronics (Naukova Dumka, Kiev, 1978) [in Russian].
M. Zerbst, Z. Angew. Phys. 22, 3039 (1966).
S. I. Kang and D. K. Schroder, Phys. Status Solidi A 89, 13 (1985).
S. I. Vlasov, P. B. Parchinskii, and L. G. Ligai, Mikroélektronika 32, 121 (2003).
P. B. Parchinskii, S. I. Vlasov, R. A. Muminov, et al., Pis’ma Zh. Tekh. Fiz. 26(10), 40 (2000) [Tech. Phys. Lett. 26, 420 (2000)].
L. S. Berman and A. A. Lebedev, Deep Level Transient Spectroscopy in Semiconductors (Nauka, Leningrad, 1981) [in Russian].
V. S. Pershenkov, V. D. Popov, and A. V. Shal’nov, Surface Radiation Effects in Integrated Circuits (Énergoatomizdat, Moscow, 1988) [in Russian].
E. I. Gol’dman and A. G. Zhdan, Fiz. Tekh. Poluprovodn. (St. Petersburg) 29, 428 (1995) [Semiconductors 29, 219 (1995)].
Author information
Authors and Affiliations
Additional information
__________
Translated from Pis’ma v Zhurnal Tekhnichesko\(\overset{\lower0.5em\hbox{$\smash{\scriptscriptstyle\smile}$}}{l}\) Fiziki, Vol. 31, No. 7, 2005, pp. 40–44.
Original Russian Text Copyright © 2005 by Parchinski\(\overset{\lower0.5em\hbox{$\smash{\scriptscriptstyle\smile}$}}{l}\), Liga\(\overset{\lower0.5em\hbox{$\smash{\scriptscriptstyle\smile}$}}{l}\), Mansurov, Iulchiev.
Rights and permissions
About this article
Cite this article
Parchinskii, P.B., Ligai, L.G., Mansurov, K.Z. et al. The effect of γ radiation on the temperature dependence of the surface generation velocity at a Si-SiO2 interface. Tech. Phys. Lett. 31, 288–289 (2005). https://doi.org/10.1134/1.1920373
Received:
Issue Date:
DOI: https://doi.org/10.1134/1.1920373