Abstract
The growth of silicon carbide (SiC) nanoclusters by molecular beam epitaxy on silicon substrates has been studied using a combination of experimental and theoretical methods. The first results concerning the initial stages of this growth are presented.
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Translated from Pis’ma v Zhurnal Tekhnichesko\(\overset{\lower0.5em\hbox{$\smash{\scriptscriptstyle\smile}$}}{l} \) Fiziki, Vol. 30, No. 15, 2004, pp. 48–54.
Original Russian Text Copyright © 2004 by Trushin, Zhurkin, Safonov, Schmidt, Kharlamov, Korolev, Lubov, Pezoldt.
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Trushin, Y.V., Zhurkin, E.E., Safonov, K.L. et al. Initial stages of the MBE growth of silicon carbide nanoclusters on a silicon substrate. Tech. Phys. Lett. 30, 641–643 (2004). https://doi.org/10.1134/1.1792299
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DOI: https://doi.org/10.1134/1.1792299