Abstract
A method is proposed for calculating the cathode erosion profile in planar magnetron ion-sputtering systems. The method uses integral characteristics of the magnetic and electric fields and does not require detailed information on the spatial characteristics of the discharge plasma. The calculated results are compared with experimental cathode profiles for rectangular and circular planar ion-sputtering systems.
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Translated from Zhurnal Tekhnichesko\(\overset{\lower0.5em\hbox{$\smash{\scriptscriptstyle\smile}$}}{l} \) Fiziki, Vol. 73, No. 10, 2003, pp. 46–50.
Original Russian Text Copyright © 2003 by Burmakinski\(\overset{\lower0.5em\hbox{$\smash{\scriptscriptstyle\smile}$}}{l} \), Rogov.
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Burmakinskii, I.Y., Rogov, A.V. Calculation of the erosion profile of a cathode for magnetron ion-sputtering systems. Tech. Phys. 48, 1264–1269 (2003). https://doi.org/10.1134/1.1620119
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DOI: https://doi.org/10.1134/1.1620119