Abstract
Optical emission spectra from the microwave discharge plasma that is used to activate gas-phase deposition of carbon films are systematically investigated under various deposition conditions. The line emission intensities from CH and C2 radicals, which are responsible for the growth of the diamond and graphite phases, respectively, are studied as functions of the main macroparameters of the process. To find the relation between the features of the emission spectra and the composition of the films obtained, the films were examined using Raman spectroscopy and electron microscopy. It is shown that monitoring the relative intensities of the spectral lines can be used to obtain the desired type of film, in which case the state of the substrate surface and the presence of a catalyst on it also play an important role. Experiments on the deposition of carbon films in the pulsed regime of plasma excitation show the possibility of changing the phase composition of the film by varying both the pulse repetition rate and the off-duty factor. At the same average microwave power, the rate of film deposition in the pulsed regime of plasma excitation is lower than that in a continuous discharge; however, the growth rate of the graphite phase decreases insignificantly.
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Translated from Fizika Plazmy, Vol. 29, No. 9, 2003, pp. 851–857.
Original Russian Text Copyright © 2003 by Dvorkin, Dzbanovski\(\overset{\lower0.5em\hbox{$\smash{\scriptscriptstyle\smile}$}}{l} \), Minakov, Suetin, Yur'ev.
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Dvorkin, V.V., Dzbanovskii, N.N., Minakov, P.V. et al. Controlling plasma composition during carbon film deposition in microwave discharges by means of optical-emission spectroscopy. Plasma Phys. Rep. 29, 789–795 (2003). https://doi.org/10.1134/1.1609583
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DOI: https://doi.org/10.1134/1.1609583